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Doping Processes for MEMS

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MEMS Materials and Processes Handbook

Part of the book series: MEMS Reference Shelf ((MEMSRS,volume 1))

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Abstract

Doping processes are utilized to modify electrical properties of semiconductors by making mobile charge carriers available in the material. Doping processes are used in MEMS devices for creating electrically conductive layers for power distribution, heaters, transducers, and other structures. Doped layers are also widely used for controlling specialty etch processes by modification of surface electrochemistry. Typical MEMS doping applications, standard processes for doping MEMS materials, and diagnostic techniques are reviewed.

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  1. IT Collaboratory, Rochester Institute of Technology, Rochester, NY, USA

    Alan D. Raisanen

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Correspondence to Alan D. Raisanen .

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  1. Dept. Electrical &, Computer Engineering, University of Maryland, College Park, 20742, Maryland, USA

    Reza Ghodssi

  2. Xerox Research Center, Phillips Road 147-16C, Dock 140 800, Webster, 20742, New York, USA

    Pinyen Lin

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Raisanen, A.D. (2011). Doping Processes for MEMS. In: Ghodssi, R., Lin, P. (eds) MEMS Materials and Processes Handbook. MEMS Reference Shelf, vol 1. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-47318-5_10

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