Thin Films and Heterostructures for Oxide Electronics

Authors:

ISBN: 978-0-387-25802-7 (Print) 978-0-387-26089-1 (Online)

Table of contents (13 chapters)

  1. Ferroelectrics, Nano-scale phenomena, High k Dielectrics

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      Book Chapter

      Pages 3-29

      Nanoscale Phenomena in Ferroelectric Thin Films

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      Book Chapter

      Pages 31-78

      High-K Candidates for Use as the Gate Dielectric in Silicon Mosfets

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      Book Chapter

      Pages 79-126

      Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS

  2. Magnetic Memory and Spintronics

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      Book Chapter

      Pages 129-151

      Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices

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      Book Chapter

      Pages 153-192

      Manganite, Magnetite, and Double- Perovskite Thin Films and Heterostructures

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    Book Chapter

    Pages 195-217

    Diluted Magnetic Oxide Systems

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    Book Chapter

    Pages 219-247

    Epitaxial Growth and Properties of Magnetically Doped TiO2

  5. Interfaces and Surfaces: Correlated Electron Systems

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      Book Chapter

      Pages 251-278

      Interfaces in Materials with Correlated Electron Systems

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      Book Chapter

      Pages 279-297

      Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials

  6. Wide Band Gap Semiconductors

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      Book Chapter

      Pages 301-330

      Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices

  7. Combinatorial Synthesis and Materials Discovery

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      Book Chapter

      Pages 333-352

      Combinatorial Synthesis of Functional Metal Oxide Thin Films

  8. Film Growth and Real-Time in situ Characterization

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      Book Chapter

      Pages 355-384

      Real-Time Growth Monitoring by High-Pressure Rheed During Pulsed Laser Deposition

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      Book Chapter

      Pages 385-413

      Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition