1993

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2

Editors:

ISBN: 978-1-4899-1590-0 (Print) 978-1-4899-1588-7 (Online)

Table of contents (54 chapters)

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  1. Front Matter

    Pages i-xvi

  2. Thermal Oxidation Mechanisms and Modeling

    1. Front Matter

      Pages 1-2

    2. No Access

      Book Chapter

      Pages 3-6

      Silicon Oxides and Oxidation

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      Book Chapter

      Pages 7-13

      Use of 18O Labelling to Study Growth Mechanisms in Dry Oxidation of Silicon

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      Book Chapter

      Pages 15-21

      Strain Dependent Diffusion During Dry Thermal Oxidation of Crystalline Si

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      Book Chapter

      Pages 23-30

      Oxidation of Silicon in Oxygen: Measurement of Film Thickness and Kinetics

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      Book Chapter

      Pages 31-41

      Modeling Process-Dependent Thermal Silicon Dioxide (SiO2) Films on Silicon

  3. Novel Oxidation Methods and Characterization

    1. Front Matter

      Pages 43-44

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      Book Chapter

      Pages 45-54

      New Approach to Chemically Enhanced Oxidation — A Review

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      Book Chapter

      Pages 55-62

      Kinetics of Oxidation of Silicon by Electron Cyclotron Resonance Plasmas

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      Book Chapter

      Pages 63-70

      Mechanisms of Oxidation Rate Enhancement in Negative-Point Oxygen Corona Discharge Processing of SiO2 Films on Si

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      Book Chapter

      Pages 71-79

      High Pressure Oxidation for Low Temperature Passivation of Si1-xGex Alloys

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      Book Chapter

      Pages 81-90

      A New Ellipsometry Technique for Interface Analysis: Application to Si-SiO2

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      Book Chapter

      Pages 91-98

      Observation of Thin SiO2 Films Using IR-RAS

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      Book Chapter

      Pages 99-108

      Deconvolution of Thickness-Averaged Structural and Optical Properties of Thermally Grown and Rpecvd SiO2 Films

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      Book Chapter

      Pages 109-116

      Tem Investigations of the Oxidation Kinetics of Amorphous Silicon Films

  4. Deposition and Properties of SiO2

    1. Front Matter

      Pages 117-118

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      Book Chapter

      Pages 119-129

      Thermal and X-Ray Production of Point Defects in Vitreous SiO2

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      Book Chapter

      Pages 131-144

      A Review of the EPR Spectroscopy of the Point Defects in α-Quartz: The Decade 1982–1992

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      Book Chapter

      Pages 145-156

      Formation of Si/SiO2 Heterostructures by Low-Temperature, Plasma-Assisted Oxidation and Deposition Processes

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      Book Chapter

      Pages 157-164

      Comparison of SiO2 Thin Film Properties Deposited by Distributed Electron Cyclotron Resonance Plasma Using Two Different Oxidant Gases: N2O or O2

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      Book Chapter

      Pages 165-174

      Low Temperature Synthesis and Characterization of Silicon Dioxide Films

  5. Chemical Properties of Si Surfaces Related to Oxidation and Oxide Deposition

    1. Front Matter

      Pages 175-176

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      Book Chapter

      Pages 177-186

      Native Oxide Growth and Hydrogen Bonding Features on Chemically Cleaned Silicon Surfaces

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      Book Chapter

      Pages 187-197

      Understanding the Surface Chemical and Structural Implications of HF Solution Cleaning of Silicon

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