1988

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface

Editors:

ISBN: 978-1-4899-0776-9 (Print) 978-1-4899-0774-5 (Online)

Table of contents (60 chapters)

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  1. Front Matter

    Pages i-xiii

  2. Growth Mechanisms of SIO2 Films

    1. Front Matter

      Pages 1-3

    2. No Access

      Book Chapter

      Pages 5-16

      Historical Perspectives of Silicon Oxidation

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      Book Chapter

      Pages 17-23

      Oxidation of Silicon: Tests of Mechanisms

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      Book Chapter

      Pages 25-34

      Silicon Oxidation Models Based on Parallel Mechanisms

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      Book Chapter

      Pages 35-42

      The Role of SiO in Si Oxidation at a Si-SiO2 Interface

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      Book Chapter

      Pages 43-51

      Uncertainty Analysis of Analytic Oxidation Models

    7. No Access

      Book Chapter

      Pages 53-59

      Modeling of the Oxide Growth in a Chlorine Ambient

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      Book Chapter

      Pages 61-74

      Silicon Oxidation Studies: A Review of Recent Studies on Thin Film Silicon Dioxide Formation

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      Book Chapter

      Pages 75-84

      Si Oxidation Mechanisms as Studied by Oxygen Tracer Methods

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      Book Chapter

      Pages 85-94

      The Oxidation of Silicides on Silicon

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      Book Chapter

      Pages 95-102

      Oxidation Kinetics of Si in Dry CO2

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      Book Chapter

      Pages 103-110

      A Novel Silicon Oxidation Method — HF Enhanced Oxidation

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      Book Chapter

      Pages 111-117

      Thermal Oxidation of Silicon in an Afterglow Gas

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      Book Chapter

      Pages 119-127

      Deposition of SiO2 Thin Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)

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      Book Chapter

      Pages 129-136

      Anodic SiO2 for Low Temperature Gate Dielectrics

  3. Thermal and Structural Properties of SiO2

    1. Front Matter

      Pages 137-138

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      Book Chapter

      Pages 139-148

      Local Atomic Structure of Thermally Grown SiO2 Films

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      Book Chapter

      Pages 149-157

      Structural Relaxation and Growth of SiO2 Films on Si

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      Book Chapter

      Pages 159-167

      Structural Relaxation Effects in Dry Thermal Silicon Dioxide Films on Silicon

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      Book Chapter

      Pages 169-176

      Molecular Diffusion in a-SiO2: Its Role in Annealing Radiation-Induced Defect Centers

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      Book Chapter

      Pages 177-186

      Current-Induced Charges and Hydrogen Species Distributions in MOS Silicon Dioxide Films

  4. The Atomic and Electronic Structure of the Si-SiO2 Interface

    1. Front Matter

      Pages 187-188

    2. No Access

      Book Chapter

      Pages 189-198

      The Structure of the Si/SiO 2 Interface: A Review

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