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The original online version for this chapter can be found at http://dx.doi.org/10.3938/jkps.67.995
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Cho, KH., Cho, Y.J., Chang, H.S. et al. Erratum: Effects of plasma-enhanced chemical vapor deposition (PECVD) on the carrier lifetime of Al2O3 passivation stack. Journal of the Korean Physical Society 67, 1708 (2015). https://doi.org/10.3938/jkps.67.1708
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DOI: https://doi.org/10.3938/jkps.67.1708