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Noise properties of the leakage current conduction in a ZrO2 thin film

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Abstract

In this paper, we report the leakage current conduction in a metal-oxide-semiconductor structure with a ZrO2 gate dielectric and its current noise properties. The characteristics of the leakage current in ZrO2 suggest that the leakage is caused by the trap-assisted tunneling in the low-bias region while space-charge-limited conduction is involved in the high-bias region. Lorentzian features disappear and the 1/f noise due to the carrier number fluctuation becomes dominant as the bias voltage is increased. The correlation of the Lorentzian feature in the current noise power spectrum with the time domain random telegraph signal fluctuation supports the trap-mediated carrier conduction mechanism. The transition from trap-assisted conduction to space-charge-limited conduction is discussed in terms of the noise response.

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References

  1. J. Robertson, J. Vac. Sci. Technol. B 18, 1785 (2000).

    Article  Google Scholar 

  2. R. Landauer, Nature 392, 658 (1998).

    Article  ADS  Google Scholar 

  3. G. Iannaccone, G. Lombardi, M. Macucci and B. Pellegrini, Phys. Rev. Lett. 80, 1054 (1998).

    Article  ADS  Google Scholar 

  4. S. N. Hong, K. Son, J. An and Y. Kang, J. Korean Phys. Soc. 53, 709 (2008).

    Article  ADS  Google Scholar 

  5. Y. Yeo, T. King and C. Hu, J. Appl. Phys. 92, 7266 (2002).

    Article  ADS  Google Scholar 

  6. S. M. Sze, Physics of Semiconductor Devices, 3rd ed. (Wiley, New York, 2007).

    Google Scholar 

  7. A. Rose, Phys. Rev. 97, 1538 (1955).

    Article  ADS  Google Scholar 

  8. B. K. Jones, IEEE Trans. Electron Devices 41, 2188 (1994).

    Article  ADS  Google Scholar 

  9. M. B. Weissman, Rev. Mod. Phys. 60, 537 (1988).

    Article  ADS  Google Scholar 

  10. M. O. Andersson, Z. Xiao, S. Norrman and O. Engström, Phys. Rev. B 41, 9836 (1990).

    Article  ADS  Google Scholar 

  11. N. F. Hooge, T. G. M. Kleinpenning and L. K. J. Vandamme, Rep. Prog. Phys. 44, 479 (1981).

    Article  ADS  Google Scholar 

  12. A. Van der Ziel, Noise in Solid State Devices and Circuits (Wiley, New York, 1986).

    Google Scholar 

  13. H. Cho, Y. Son, S. Lee, J. Lee, B. Park and H. Shin, J. Korean Phys. Soc. 58, 1518 (2011).

    Article  Google Scholar 

  14. L. K. J. Vandamme, X. Li and D. Rigaud, IEEE Trans. Electron Devices 41, 1936 (1994).

    Article  ADS  Google Scholar 

  15. K. R. Farmer, R. Saletti and R. A. Buhrman, Appl. Phys. Lett. 52, 1749 (1988).

    Article  ADS  Google Scholar 

  16. B. Neri, P. Olivo and B. Ricco, Appl. Phys. Lett. 51, 2167 (1987).

    Article  ADS  Google Scholar 

  17. B. Raquet, J. M. D. Coey, S. Wirth and S. von Monar, Phys. Rev. B 59, 12435 (1999).

    Article  ADS  Google Scholar 

  18. G. B. Alers, K. S. Krisch, D. Monroe, B. E. Weir and A. M. Chang, Appl. Phys. Lett. 69, 2885 (1996).

    Article  ADS  Google Scholar 

  19. G. B. Alers, B. E. Weir, M. A. Alam, G. L. Timp and T. Sorch, Proc. IRPS 36, 76 (1998).

    Google Scholar 

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Correspondence to Heejun Jeong.

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Jeong, H. Noise properties of the leakage current conduction in a ZrO2 thin film. Journal of the Korean Physical Society 63, 1980–1983 (2013). https://doi.org/10.3938/jkps.63.1980

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