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Decomposition strategies in the problems of simulation of additive laser technology processes

  • Computational and Data Acquisition Systems
  • Published:
Optoelectronics, Instrumentation and Data Processing Aims and scope

Abstract

The development of additive technologies and their application in industry is associated with the possibility of predicting the final properties of a crystallized added material. This paper describes the problem characterized by a dynamic and spatially nonuniform computational complexity, which, in the case of uniform decomposition of a computational domain, leads to an unbalanced load on computational cores. The strategy of partitioning of the computational domain is used, which minimizes the CPU time losses in the serial computations of the additive technological process. The chosen strategy is optimal from the standpoint of a priori unknown dynamic computational load distribution. The scaling of the computational problem on the cluster of the Institute on Laser and Information Technologies (RAS) that uses the InfiniBand interconnect is determined. The use of the parallel code with optimal decomposition made it possible to significantly reduce the computational time (down to several hours), which is important in the context of development of the software package for support of engineering activity in the field of additive technology.

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Authors and Affiliations

  1. Institute on Laser and Information Technologies, Branch of Federal Scientific Research Center “Crystallography and Photonics”, Russian Academy of Sciences, ul. Svyatoozerskaya 1, Shatura, 140700, Russia

    M. D. Khomenko, A. V. Dubrov & F. Kh. Mirzade

Authors
  1. M. D. Khomenko
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  2. A. V. Dubrov
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  3. F. Kh. Mirzade
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Corresponding author

Correspondence to M. D. Khomenko.

Additional information

Original Russian Text © M.D. Khomenko, A.V. Dubrov, F.Kh. Mirzade, 2016, published in Avtometriya, 2016, Vol. 52, No. 6, pp. 110–119.

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Khomenko, M.D., Dubrov, A.V. & Mirzade, F.K. Decomposition strategies in the problems of simulation of additive laser technology processes. Optoelectron.Instrument.Proc. 52, 621–629 (2016). https://doi.org/10.3103/S8756699016060145

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  • DOI: https://doi.org/10.3103/S8756699016060145

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