July 2012, 6:13,
Open Access This content is freely available online to anyone, anywhere at any time.
Date: 17 Jul 2012
Optical characterization of Cu3N thin film with Swanepoel method
Swanepoel method is employed for spectroscopic determination of optical properties of Cu3N thin film using transmittance data. Investigated films have been deposited using reactive magnetron sputtering system. Deposition time was 9 to 21 min. Refractive index, absorption coefficient, and bandgap energy of the samples are determined. Thickness of the films is calculated by Swanepoel method, and result is compared with the thickness of the films measured by profilmeter. It is shown that Swanepoel method is a reliable way to calculate the optical constants of thin films when the transmittance spectrum of the film is influenced by wavelike patterns due to reflection of the probe beam from different interfaces.
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- Optical characterization of Cu3N thin film with Swanepoel method
- Open Access
- Available under Open Access This content is freely available online to anyone, anywhere at any time.
Journal of Theoretical and Applied Physics
- Online Date
- July 2012
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- Online ISSN
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- Copper nitride
- Thin film
- Magnetron sputtering
- Energy gap
- Swanepoel method.