Abstract
Indium-antimonide quantum dots (7–9 × 109 cm2) are produced on an InAs(001) substrate by metal-organic vapor-phase epitaxy at a temperature of T = 440°C. Epitaxial deposition occurred simultaneously onto an InAs binary matrix and an InAsSbP quaternary alloy matrix layer lattice-matched to the InAs substrate in terms of the lattice parameter. Transformation of the quantum-dot shape and size is studied in relation to the chemical composition of the working matrix surface, onto which the quantum dots are deposited. The use of a multicomponent layer makes it possible to control the lattice parameter of the matrix and the strains produced in the system during the formation of self-assembled quantum dots.
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Original Russian Text © V.V. Romanov, P.A. Dement’ev, K.D. Moiseev, 2016, published in Fizika i Tekhnika Poluprovodnikov, 2016, Vol. 50, No. 7, pp. 927–931.
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Romanov, V.V., Dement’ev, P.A. & Moiseev, K.D. Effect of multicomponent InAsSbP matrix surface on formation of InSb quantum dots at MOVPE growth. Semiconductors 50, 910–914 (2016). https://doi.org/10.1134/S1063782616070216
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DOI: https://doi.org/10.1134/S1063782616070216