Free-standing optical filters for a nanolithography source operating in the 12–15 nm wavelength range
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- Belik, V.P., Zadiranov, Y.M., Il’inskaya, N.D. et al. Tech. Phys. Lett. (2007) 33: 508. doi:10.1134/S1063785007060193
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Optical filters in the form of free-standing multilayer films have been obtained for a nanolithography source operating in the 12–15 nm range of wavelengths. A method for the synthesis of such filters is described.