Dopant diffusion dynamics and optimal diffusion time as influenced by diffusion-coefficient nonuniformity
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- Pankratov, E.L. Russ Microelectron (2007) 36: 33. doi:10.1134/S1063739707010040
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The dynamics of dopant diffusion in forming a pn junction is investigated theoretically for an epilayer-substrate system. The influence is examined of diffusion-coefficient nonuniformity on the doping dynamics. On this basis, requirements for the depth profile of the diffusion coefficient are defined in respect of the junction abruptness and depth. Further, the optimal diffusion time is determined in terms of striking a balance between the doping uniformity in the epilayer and the abruptness of the junction.