, Volume 106, Issue 1, pp 72-77
Date: 04 Feb 2009

Optical properties of the HfO2 − x N x and TiO2 − x N x films prepared by ion beam sputtering

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Optical characteristics of the HfO2 − x N x and TiO2 − x N x films obtained by reactive ion beam sputtering have been investigated by spectral ellipsometry. The chemical composition of the films was determined using X-ray photoelectron spectroscopy. The nitrogen content in the oxynitride films (determined by the N2/O2 ratio in the gas mixture during synthesis) reached ≈9 at % for TiO2 − x N x and ≈ 6 at % for HfO2 − x N x . It is found that the dispersion relations n(λ) and k(λ) for the TiO2 − x N x films change from those characteristic of titanium dioxide to those typical of titanium nitride with an increase in the nitrogen content from 0 to ≈9 at %. The optical parameters of the HfO2 − x N x films depend weakly on the nitrogen content in the range 0–6 at %.
Original Russian Text © V.V. Atuchin, V.N. Kruchinin, A.V. Kalinkin, V.Sh. Aliev, S.V. Rykhlitskiĭ, V.A. Shvets, E.V. Spesivtsev, 2009, published in Optika i Spektroskopiya, 2009, Vol. 106, No. 1, pp. 77–82.