, Volume 47, Issue 4, pp 412-416
Date: 30 Mar 2011

Growth of ultrathin Nb2O5 films on quartz substrates

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Abstract

Niobium oxide films have been grown by reactive rf sputtering in a vacuum system and characterized by absorption spectroscopy and X-ray diffraction. The thickness of the (optically transparent) films has been determined as a function of sputtering time by examining interference effects in a plane-parallel layer. The average deposition rate is determined to be 7.4 ± 0.3 Å/min (95% confidence interval).

Original Russian Text © S.V. Zaitsev, Yu.V. Gerasimenko, S.N. Saltykov, D.A. Khoviv, A.M. Khoviv, 2011, published in Neorganicheskie Materialy, 2011, Vol. 47, No. 4, pp. 468–472.