Technical Physics Letters

, Volume 31, Issue 11, pp 947–950

Structural and magnetic characteristics of Fe/Si bilayer and multilayer films obtained by thermal deposition in ultrahigh vacuum

Authors

  • S. N. Varnakov
    • Kirensky Institute of Physics, Siberian DivisionRussian Academy of Sciences
  • A. S. Parshin
    • Siberian State Aerospace University
  • S. G. Ovchinnikov
    • Kirensky Institute of Physics, Siberian DivisionRussian Academy of Sciences
  • D. Rafaja
    • Institute of Physical MetallurgyTU Bergakademie Freiberg
  • L. Kalvoda
    • Czech Technical University
  • A. D. Balaev
    • Kirensky Institute of Physics, Siberian DivisionRussian Academy of Sciences
  • S. V. Komogortsev
    • Kirensky Institute of Physics, Siberian DivisionRussian Academy of Sciences
Article

DOI: 10.1134/1.2136961

Cite this article as:
Varnakov, S.N., Parshin, A.S., Ovchinnikov, S.G. et al. Tech. Phys. Lett. (2005) 31: 947. doi:10.1134/1.2136961

Abstract

The structural and magnetic characteristics of Fe/Si bilayer and multilayer films with nanometer-thick layers obtained by thermal deposition in ultrahigh vacuum have been studied by methods of small-angle X-ray scattering, electron spectroscopy, and magnetometry. It is established that the mechanisms involved in the formation of Fe/Si and Si/Fe interfaces are different.

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© Pleiades Publishing, Inc. 2005