Crystallization of amorphous hydrogenated silicon films deposited under various conditions
- Cite this article as:
- Golikova, O.A., Bogdanova, E.V. & Babakhodzhaev, U.S. Semiconductors (2002) 36: 1180. doi:10.1134/1.1513865
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The possibility of using the magnetron-assisted silane decomposition technique for the deposition of a-Si:H films as the basic materials for the production of polysilicon is analyzed. It is shown how specific features of the film structure affect the crystallization process.