Catalysis Letters

, Volume 51, Issue 1, pp 53–58

Chemical vapor deposition of gold on Al2O3, SiO2, and TiO2 for the oxidation of CO and of H2

Authors

  • Mitsutaka Okumura
    • AIST, MITIOsaka National Research Institute
  • Shyunichi Nakamura
    • Department of Applied ChemistryOsaka Institute of Technology
  • Susumu Tsubota
    • AIST, MITIOsaka National Research Institute
  • Toshiko Nakamura
    • AIST, MITIOsaka National Research Institute
  • Masashi Azuma
    • Department of Applied ChemistryOsaka Institute of Technology
  • Masatake Haruta
    • AIST, MITIOsaka National Research Institute
Article

DOI: 10.1023/A:1019020614336

Cite this article as:
Okumura, M., Nakamura, S., Tsubota, S. et al. Catalysis Letters (1998) 51: 53. doi:10.1023/A:1019020614336

Abstract

In order to clarify the effect of metal oxide support on the catalytic activity of gold for CO oxidation, gold has been deposited on SiO2 with high dispersion by chemical vapor deposition (CVD) of an organo-gold complex. Comparison of Au/SiO2 with Au/Al2O3 and Au/TiO2, which were prepared by both CVD and liquid phase methods, showed that there were no appreciable differences in their catalytic activities as far as gold is deposited as nanoparticles with strong interaction. The perimeter interface around gold particles in contact with the metal oxide supports appears to be essential for the genesis of high catalytic activities at low temperatures.

chemical vapor deposition gold catalysts CO oxidation hydrogen oxidation

Copyright information

© Kluwer Academic Publishers 1998