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Characterization of sputtered NiO films using XRD and AFM

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Authors and Affiliations

  1. Department of Microelectronics, Slovak University of Technology, Ilkovicova 3, 812 19, Bratislava, Slovakia

    I. Hotovy

  2. Institute of Electrical Engineering, Slovak Academy of Sciences, Dubravska cesta 9, 842 39, Bratislava, Slovakia

    J. Huran

  3. Institut fuer Werkstofftechnik, Technische Universitaet Ilmenau, PF 100565, D-98684, Ilmenau, Germany

    L. Spiess

Authors
  1. I. Hotovy
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  2. J. Huran
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  3. L. Spiess
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Hotovy, I., Huran, J. & Spiess, L. Characterization of sputtered NiO films using XRD and AFM. Journal of Materials Science 39, 2609–2612 (2004). https://doi.org/10.1023/B:JMSC.0000020040.77683.20

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