Journal of Applied Electrochemistry

, Volume 30, Issue 12, pp 1345–1350

Oxidation of carboxylic acids at boron-doped diamond electrodes for wastewater treatment

  • D. Gandini
  • E. Mahé
  • P.A. Michaud
  • W. Haenni
  • A. Perret
  • Ch. Comninellis
Article

DOI: 10.1023/A:1026526729357

Cite this article as:
Gandini, D., Mahé, E., Michaud, P. et al. Journal of Applied Electrochemistry (2000) 30: 1345. doi:10.1023/A:1026526729357

Abstract

Thin boron-doped diamond films have been prepared by HF CVD (hot filament chemical vapour deposition technique) on conductive p-Si substrate (Si/Diamond). The morphology of these Si/diamond electrodes has been investigated by SEM and Raman spectroscopy. The electrochemical behaviour of the Si/diamond electrodes in 1 M H2SO4 and in 1 M H2SO4 + carboxylic acids has been investigated by cyclic voltammetry. Finally, the electrochemical oxidation of some simple carboxylic acids (acetic, formic, oxalic) has been investigated by bulk electrolysis. These acids can be oxidized at Si/diamond anodes to CO2, in the potential region of water and/or the supporting electrolyte decomposition, with high current efficiency.

boron-doped diamond electrodeselectrochemical oxidationorganicswastewater treatment

Copyright information

© Kluwer Academic Publishers 2000

Authors and Affiliations

  • D. Gandini
    • 1
  • E. Mahé
    • 1
    • 2
  • P.A. Michaud
    • 1
  • W. Haenni
    • 3
  • A. Perret
    • 3
  • Ch. Comninellis
    • 1
  1. 1.Institute of Chemical EngineeringSwiss Federal Institute of TechnologyLausanneSwitzerland
  2. 2.On leave from UMR 7612 LI2C-CNRS-UPMCParis Cedex 05France
  3. 3.CSEM Centre Suisse d'Electronique et de Microtechnique S.ANeuchâtelSwitzerland