Tribology Letters

, Volume 12, Issue 3, pp 189–193

Molecular Interlayers and the Mechanism of Abrasive Wear of Ultrathin Metal Films

Authors

  • F.T. Xu
    • Department of Metallurgical and Materials EngineeringThe University of Alabama
  • P.P. Ye
    • Department of Chemistry, The Center for Materials for Information TechnologyThe University of Alabama
  • M. Curry
    • Department of Chemistry, The Center for Materials for Information TechnologyThe University of Alabama
  • J.A. Barnard
    • Department of Materials Science and EngineeringUniversity of Pittsburgh
  • S.C. Street
    • Department of Chemistry, The Center for Materials for Information TechnologyThe University of Alabama
Article

DOI: 10.1023/A:1014763425001

Cite this article as:
Xu, F., Ye, P., Curry, M. et al. Tribology Letters (2002) 12: 189. doi:10.1023/A:1014763425001

Abstract

Striking differences have been observed in the deformation modes associated with nanoscratch events on ultrathin Cu layers deposited on SiOx with and without a dendrimer interlayer. In the absence of the dendrimer monolayer significant lateral deformation and distinct ridge formation along the wear track indicative of plowing and wedge formation are observed. By contrast, dendrimer monolayer-mediated films exhibit restricted lateral deformation yielding ridgeless scratches apparently formed in a nearly pure cutting mode.

dendrimersnanotribologyhybrid nanocompositesultrathin metal films

Copyright information

© Plenum Publishing Corporation 2002