Article

Tribology Letters

, Volume 12, Issue 3, pp 189-193

First online:

Molecular Interlayers and the Mechanism of Abrasive Wear of Ultrathin Metal Films

  • F.T. XuAffiliated withDepartment of Metallurgical and Materials Engineering, The University of Alabama
  • , P.P. YeAffiliated withDepartment of Chemistry, The Center for Materials for Information Technology, The University of Alabama
  • , M. CurryAffiliated withDepartment of Chemistry, The Center for Materials for Information Technology, The University of Alabama
  • , J.A. BarnardAffiliated withDepartment of Materials Science and Engineering, University of Pittsburgh
  • , S.C. StreetAffiliated withDepartment of Chemistry, The Center for Materials for Information Technology, The University of Alabama

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Abstract

Striking differences have been observed in the deformation modes associated with nanoscratch events on ultrathin Cu layers deposited on SiOx with and without a dendrimer interlayer. In the absence of the dendrimer monolayer significant lateral deformation and distinct ridge formation along the wear track indicative of plowing and wedge formation are observed. By contrast, dendrimer monolayer-mediated films exhibit restricted lateral deformation yielding ridgeless scratches apparently formed in a nearly pure cutting mode.

dendrimers nanotribology hybrid nanocomposites ultrathin metal films