Novel fabrication methods for submicrometer Josephson junction qubits

  • A. Potts
  • P. R. Routley
  • G. J. Parker
  • J. J. Baumberg
  • P. A. J. de Groot
Article

DOI: 10.1023/A:1011279908265

Cite this article as:
Potts, A., Routley, P.R., Parker, G.J. et al. Journal of Materials Science: Materials in Electronics (2001) 12: 289. doi:10.1023/A:1011279908265

Abstract

Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

Copyright information

© Kluwer Academic Publishers 2001

Authors and Affiliations

  • A. Potts
    • 1
  • P. R. Routley
    • 1
  • G. J. Parker
    • 1
  • J. J. Baumberg
    • 1
  • P. A. J. de Groot
    • 1
  1. 1.Department of Electronics and Computer Science and *Department of Physics and AstronomyUniversity of SouthamptonHighfield, SouthamptonUK