Novel fabrication methods for submicrometer Josephson junction qubits
- Cite this article as:
- Potts, A., Routley, P.R., Parker, G.J. et al. Journal of Materials Science: Materials in Electronics (2001) 12: 289. doi:10.1023/A:1011279908265
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Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.