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Novel fabrication methods for submicrometer Josephson junction qubits

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Abstract

Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

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Authors and Affiliations

  1. Department of Electronics and Computer Science and *Department of Physics and Astronomy, University of Southampton, Highfield, Southampton, SO17 1BJ, UK

    A. Potts, P. R. Routley, G. J. Parker, J. J. Baumberg & P. A. J. de Groot

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  1. A. Potts
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  2. P. R. Routley
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  3. G. J. Parker
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  4. J. J. Baumberg
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  5. P. A. J. de Groot
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Potts, A., Routley, P.R., Parker, G.J. et al. Novel fabrication methods for submicrometer Josephson junction qubits. Journal of Materials Science: Materials in Electronics 12, 289–293 (2001). https://doi.org/10.1023/A:1011279908265

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  • DOI: https://doi.org/10.1023/A:1011279908265

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