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Reduction in Photocurrent Loss and Improvement in Performance of Single Junction Solar Cell Due to Multistep Grading of Hydrogenated Amorphous Silicon Germanium Active Layer

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Abstract

Single junction solar cells were fabricated with intrinsic hydrogenated amorphous silicon germanium (a-SiGe:H) as the active layer, that shows a 10% photovoltaic conversion efficiency. The a-SiGe:H active layer of the solar cells of type-A had constant band gap materials while that of type-B had a four step graded band gap by composition gradient (CG). The cells with composition gradient show an enhancement in fill factor and open circuit voltage (V oc) by 5% and 20 mV respectively, with respect to a cell without the graded band gap active layer. Such an enhanced device performance is attributed to reduction in recombination loss of photo-generated electron hole pairs. The effect of this photo-current loss was investigated in the electrical bias dependent external quantum efficiencies (EQE), illumination dependent current-voltage measurements and dark current-voltage characteristics. The device parameters like reverse saturation current density (J o), series resistance (R s) and diode quality factor (n) were also estimated. In comparison to the cell without the composition gradient, the EQE shows a reduced recombination loss across the whole wavelength range for the cell with the CG. Furthermore, the introduction of the CG results in a significantly increased shunt resistance from 720 to 1200 Ω.cm 2. The estimated n values of the cells under dark operating condition, decreases from 1.8 to 1.7 along with J o from 3 × 10 −7 down to 4.5 × 10 −8 A/cm 2 with CG, while the same parameters decreased from 3.73 to 3.06, 2.96 × 10 −6 to 3.05 × 10 −7 A/cm 2 respectively under AM1.5G insolation.

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Correspondence to S. M. Iftiquar or Junsin Yi.

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Pham, D.P., Kim, S., Park, J. et al. Reduction in Photocurrent Loss and Improvement in Performance of Single Junction Solar Cell Due to Multistep Grading of Hydrogenated Amorphous Silicon Germanium Active Layer. Silicon 10, 759–767 (2018). https://doi.org/10.1007/s12633-016-9527-4

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  • DOI: https://doi.org/10.1007/s12633-016-9527-4

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