Abstract
In this study, the phosphotungstic acid /p-Si diode was fabricated by a drop coating method. The fabricated diode had excellent rectifying properties. The electrical properties of the diode were investigated in the temperature range of 50-400 K. The optical band gap of the phosphotungstic acid film was determined and found to be 3.66 eV. The electrical and photoresponse properties of an Al/p-Si-phosphotungstic acid/Al photodiode were studied. The electronic parameters such as ideality factor (n), barrier height (Φ B ) and series resistance (R s ) were found to be strongly temperature dependent.
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The authors extend their appreciation to the International Scientific Partnership Program ISPP at King Saud University for funding this research work through ISPP# 0046.
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El-Nasser, H.M., Mensah-Darkwa, K., Al-Senany, N. et al. A Functional Material Based Heterojunction Diode. Silicon 10, 737–746 (2018). https://doi.org/10.1007/s12633-016-9525-6
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DOI: https://doi.org/10.1007/s12633-016-9525-6