Article

International Journal of Precision Engineering and Manufacturing

, Volume 12, Issue 5, pp 877-883

Sub-micro to nanometer scale laser direct writing techniques with a contact probe

  • Howon JungAffiliated withSchool of Mechanical Engineering, Yonsei University
  • , Yongwoo KimAffiliated withSchool of Mechanical Engineering, Yonsei University
  • , Seok KimAffiliated withSchool of Mechanical Engineering, Yonsei University
  • , Jinhee JangAffiliated withSchool of Mechanical Engineering, Yonsei University
  • , Jae Won HahnAffiliated withSchool of Mechanical Engineering, Yonsei University Email author 

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Abstract

Modern laser direct writing techniques provide tools for high-precision fabrication and manufacturing at the micro scale. As the integration of devices increases, the feature size is being reduced to the nanometer scale. In this paper, we developed a contact-probe-based laser direct writing technique that covers the sub-micro to nanometer scale. The proposed probe uses a solid immersion lens or a nano-aperture to enhance the resolution in a near-field writing method. We integrated several of the proposed probes with a conventional laser direct writing system and achieved pattern resolutions up to 35 nm with a 405 nm wavelength laser. Furthermore, the scanning speed (∼ 10 mm/s) of the probes was high enough to use it in actual industry fabrication processes. With the proposed probe-based system, electronic, photonic, or plasmonic devices that require sub-micro meter scale features can be fabricated by means of laser direct writing. The minimum width of the line pattern recorded with the plasmonic device was 35nm.

Keywords

Laser direct writing Nano-aperture Near-field recording Solid immersion lens Surface plasmon polariton