International Journal of Precision Engineering and Manufacturing

, 12:877

Sub-micro to nanometer scale laser direct writing techniques with a contact probe


  • Howon Jung
    • School of Mechanical EngineeringYonsei University
  • Yongwoo Kim
    • School of Mechanical EngineeringYonsei University
  • Seok Kim
    • School of Mechanical EngineeringYonsei University
  • Jinhee Jang
    • School of Mechanical EngineeringYonsei University
    • School of Mechanical EngineeringYonsei University

DOI: 10.1007/s12541-011-0117-5

Cite this article as:
Jung, H., Kim, Y., Kim, S. et al. Int. J. Precis. Eng. Manuf. (2011) 12: 877. doi:10.1007/s12541-011-0117-5


Modern laser direct writing techniques provide tools for high-precision fabrication and manufacturing at the micro scale. As the integration of devices increases, the feature size is being reduced to the nanometer scale. In this paper, we developed a contact-probe-based laser direct writing technique that covers the sub-micro to nanometer scale. The proposed probe uses a solid immersion lens or a nano-aperture to enhance the resolution in a near-field writing method. We integrated several of the proposed probes with a conventional laser direct writing system and achieved pattern resolutions up to 35 nm with a 405 nm wavelength laser. Furthermore, the scanning speed (∼ 10 mm/s) of the probes was high enough to use it in actual industry fabrication processes. With the proposed probe-based system, electronic, photonic, or plasmonic devices that require sub-micro meter scale features can be fabricated by means of laser direct writing. The minimum width of the line pattern recorded with the plasmonic device was 35nm.


Laser direct writingNano-apertureNear-field recordingSolid immersion lensSurface plasmon polariton



wavelength of laser


numerical aperture of optics


Full Width Half Maximum

Copyright information

© Korean Society for Precision Engineering and Springer-Verlag Berlin Heidelberg  2011