Nano Express

Nanoscale Research Letters

, Volume 4, Issue 7, pp 680-683

Open Access This content is freely available online to anyone, anywhere at any time.

Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

  • Kartika Chandra SahooAffiliated withDepartment of Materials Science and Engineering, National Chiao Tung University
  • , Men-Ku LinAffiliated withDepartment of Materials Science and Engineering, National Tsing Hua University
  • , Edward-Yi ChangAffiliated withDepartment of Materials Science and Engineering, National Chiao Tung University Email author 
  • , Yi-Yao LuAffiliated withDepartment of Materials Science and Engineering, National Chiao Tung University
  • , Chun-Chi ChenAffiliated withDepartment of Materials Science and Engineering, National Chiao Tung University
  • , Jin-Hua HuangAffiliated withDepartment of Materials Science and Engineering, National Tsing Hua University
  • , Chun-Wei ChangAffiliated withTaiwan Semiconductor Manufacturing Company Ltd

Abstract

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.

Keywords

Sub-wavelength Structure Solar cell SWS fabrication Reflectance Anti-reflective coatings