Abstract
Strategies to reduce capacitance effects associated with shrinking integrated circuit (IC) design rules include incorporating low resistivity metals and insulators with low dielectric values, or “low-κ” materials. Using such materials in current IC fabrication schemes necessitates the development of reliable chemical mechanical polishing (CMP) processes and process consumables tailored for them. Here we present results of CMP experiments performed on FLARE™ 2.0 using a specialized zirconium oxide (ZrO2) polishing slurry. FLARE™ 2.0 is a poly(arylene) ether from AlliedSignal, Inc. with a nominal dielectric constant of 2.8. In addition, we provide insight into possible removal mechanisms during the CMP of organic polymers by examining the performance of numerous abrasive slurries. Although specific to a limited number of polymers, the authors suggest that the information presented in this paper is relevant to the CMP performance of many polymer dielectric materials.
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References
I. Newton, 1695, Opticks 4th Ed. 1730, (New York: Dover Publications Inc., 1952).
M.A. Fury, Solid State Technology 40, 81, (1997).
J.F. Archard, J. Appl. Phys. 24, 981 (1953).
N. J. Brown, Document MISC4476, Revision 1, (Livermore, CA: Lawrence Livermore National Laboratory, 1990).
W.L. Silvernail and B.L. Silvernail, Optical World 9, 7 (1980).
F.W. Preston, J. Soc. Glass Tech. 11, 214 (1927).
H.H. Karow, Fabrication Methods for Precision Optics (New York: John Wiley & Sons, Inc., 1993), p. 183.
D.F. Horne, Optical Production Technology, (Bristol, Great Britain: Adam Hilger Ltd, 1972), p. 235.
Technical Bulletin on Pigments #11; Basic Characteristics of Aerosil, 4th Ed., (Degussa Corporation 1993).
W.L. Silvernail, Observations in Glass Polishing, Technical Digest, Topical Meeting on Optical Fabrication and Technology, (Optical Society of America, 1982).
Y. Homma, T. Furusawa, K. Kusukawa, M. Nagasawa, Y. Nakamura, M. Saitou, H. Morishima and H. Sata, Proc. 1995 VMIC Conf., Santa Clara, CA., June 27–29, 1995, p. 457.
J. Tylczak, Abrasive Wear ASM Handbook on Friction Lubrication and Wear Technology, Vol. 18, (Materials Park, OH: ASM International, 1992), p. 184.
N.J. Brown and L.M. Cook, The Role of Abrasion in the Optical Polishing of Metals and Glasses, Technical Digest, Topical Meeting on the Science of Polishing, April 17, 1984, (Optical Society of America).
V.E. Henrich and P. Cox, The Surface Science of Metal Oxides, (New York): Press Syndicate of the University of Cambridge, (1994).
T.E. Fischer, Tribochemistry of Ceramics: science and applications, New Directions in Tribology, ed. I.M. Hutchings, (London: Mech. Engrg. Publications Ltd., 1997), p. 211.
I.M. Hutchings, Tribology: Friction and Wear of Engineering Materials, (London: Edward Arnold, a Division of Hodder Headline PLC, 1992).
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Towery, D., Fury, M.A. Chemical mechanical polishing of polymer films. J. Electron. Mater. 27, 1088–1094 (1998). https://doi.org/10.1007/s11664-998-0142-z
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DOI: https://doi.org/10.1007/s11664-998-0142-z