Abstract
Titanium dioxide (TiO2) thin films were synthesized on glass substrates by spray pyrolysis. The effect of solution flow rate on the physical properties of the films was investigated by use of x-ray diffraction (XRD), scanning electron microscopy, atomic force microscopy (AFM), and spectrophotometry techniques. XRD analysis revealed the tetragonal anatase phase of TiO2 with highly preferred (101) orientation. AFM images showed that grain size on top of TiO2 thin films depended on solution flow rate. An indirect band gap energy of 3.46 eV was determined by means of transmission and reflection measurements. The envelope method, based on the optical transmission spectrum, was used to determine film thickness and optical constants, for example real and imaginary parts of the dielectric constant, refractive index, and extinction coefficient. Ultraviolet and visible photoluminescence emission peaks were observed at room temperature. These peaks were attributed to the intrinsic emission and to the surface defect states, respectively.
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Z. Lu, X. Jiang, B. Zhou, X. Wu, and L. Lu, Appl. Surf. Sci. 257, 10715 (2011).
J. Ben Naceur, R. Mechiakh, F. Bousbih, and R. Chtourou, Appl. Surf. Sci. 257, 10699 (2011).
S. Ding, B. Gao, D. Shan, Y. Sun, and S. Cosnier, Biosens. Bioelectron. 39, 342 (2013).
L. Hou, P. Liu, Y. Li, and C. Wu, Thin Solid Films 517, 4926 (2009).
I. Oja Acik, A. Katerski, A. Mere, J. Aarik, A. Aidla, T. Dedova, and M. Krunks, Thin Solid Films 517, 2443 (2009).
Y. Hu, H.L. Tsai, and C.L. Huang, J. Eur. Ceram. Soc. 23, 691 (2003).
E. Haimi, H. Lipsonen, J. Larismaa, M. Kapulainen, J. Krzak-Ros, and S.P. Hannula, Thin Solid Films 519, 5882 (2011).
A. Mayabadi, V. Waman, M. Kamble, S. Ghosh, B. Gabhale, S. Rondiya, A. Rokade, S. Khadtare, V. Sathe, H. Pathan, S. Gosavi, and S. Jadkar, J. Phys. Chem. Solids 75, 182 (2014).
K. Kollbek, M. Sikora, Cz. Kapusta, J. Szlachetko, A. Brudnik, E. Kusior, K. Zakrzewska, and M. Radecka, Radiat. Phys. Chem. 93, 40 (2013).
S. Zhang, Y.F. Zhu, and D.E. Brodie, Thin Solid Films 213, 265 (1992).
A. Mani, C. Huisman, A. Goossens, and J. Schoonman, J. Phys. Chem. B 112, 10086 (2008).
D.Y. Lee, J.T. Kim, J.H. Park, Y.H. Kim, I.K. Lee, M.H. Lee, and B.Y. Kim, Curr. Appl. Phys. 13, 1301 (2013).
E. Wimmer, H. Krakauer, M. Weinert, and A.J. Freeman, Phys. Rev. B 24, 864 (1981).
P. Blaha, K. Schwarz, G.K.H. Madsen, D. Kavanicka, and J. Luitz, WIEN2K, an Augmented Plane Wave Plus Local Orbitals Program for Calculating Crystal Properties (Wien: Karlheinz Schwarz, Techn. Universitat Wien, 2001). ISBN 3-9501031-1-2.
F. Tran and P. Blaha, Phys. Rev. Lett. 102, 226401 (2009).
I. Oja Acik, V. Kiisk, M. Krunks, I. Sildos, A. Junolainen, M. Danilson, A. Mere, and V. Mikli, Appl. Surf. Sci. 261, 735 (2012).
M.J. Buerger, X-ray crystallography (New York: Wiley Inc, 1960), p. 23.
D.P. Padiyan, A. Marikani, and K.R. Murali, Mat. Chem. Phys. 78, 51 (2002).
K. Girija, S. Thirumalairajan, S.M. Mohan, and J. Chandrasekaran, Chalco. Lett. 6, 351 (2009).
A. Akkari, M. Reghima, C. Guasch, and N. Kamoun-Turki, Mater. Sci. 47, 1365 (2012).
G. Sai and L.B. Gui, Chin. Phys. B 21, 057104 (2012).
J.I. Pankove, Optical Processes in Semiconductors (New Jersey: Prentice-Hall Inc, 1971), p. 93.
J. Tauc, Amorphous and Liquid Semiconductors (New York: Plenum Press, 1974), p. 159.
J.C. Manifacier, J. Gassiot, and J.P. Fillard, J. Phys. E 9, 1002 (1976).
S. Belgacemet and R. Bennaceur, Rev. Phys. Appl. 25, 1245 (1990).
A.V. Manole, M. Dobromir, M. Gîrtan, R. Mallet, G. Rusu, and D. Luca, Ceram. Int. 39, 4771 (2013).
B. Houng, C.C. Liu, and M.T. Hung, Ceram. Int. 39, 3669 (2013).
N. Revathi, P. Prathap, and K.T. Ramakrishna, Reddy. Solid State Sci. 11, 1288 (2009).
P.B. Nair, V.B. Justinvictor, G.P. Daniel, K. Joy, V. Ramakrishnan, D.D. Kumar, and P.V. Thomas, Thin Solid Films 550, 121 (2014).
P.B. Nair, V.B. Justinvictor, G.P. Daniel, K. Joy, V. Ramakrishnan, and P.V. Thomas, Appl. Surf. Sci. 257, 10869 (2011).
K. Murali Krishna, M. Mosaddcq-ur-Rahman, T. Miki, T. Soga, K. Igarashi, S. Tanemura, and M. Umeno, Appl. Surf. Sci. 113, 149 (1997).
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Naffouti, W., Nasr, T.B., Mehdi, A. et al. Effect of Sprayed Solution Flow Rate on the Physical Properties of Anatase TiO2 Thin Films. J. Electron. Mater. 43, 4033–4040 (2014). https://doi.org/10.1007/s11664-014-3341-9
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DOI: https://doi.org/10.1007/s11664-014-3341-9