Abstract
Following the suggestion that the AsHg–V Hg and AsHg–2V Hg defect complexes are potential sources of carrier compensation observed in As-doped HgCdTe, we have studied the electronic properties and formation energies of these complexes. We find that these complexes are electrically active acceptors but have exceedingly high formation energies, meaning that they play no role in carrier compensation except at low temperatures. V Hg will thus likely remain as an isolated defect. Such a model of V Hg incorporation allows us to further predict the postgrowth As activation. Our prediction emphasizes the AsHg–2V Hg complex as the starting defect for As activation, rather than the AsHg–V Hg pair as previously suggested.
Similar content being viewed by others
References
J.W. Garland, C.H. Grein, B. Yang, P.S. Wijewarnasuriya, F. Aqariden, and S. Sivananthan, Appl. Phys. Lett. 74, 1975 (1999).
Y.S. Ryu, Y.B. Heo, B.S. Song, S.J. Yoon, Y.J. Kim, and T.W. Kang, Appl. Phys. Lett. 83, 3776 (2003).
D. Shaw and P. Capper, J. Mater. Sci.: Mater. Electron. 19, 67 (2008).
Y. Selamet, C.H. Grein, T.S. Lee, and S. Sivananthan, J. Vac. Sci. Technol. B 19, 1488 (2001).
P. Boieriu, C.H. Grein, H.S. Jung, J. Garland, and V. Nathan, Appl. Phys. Lett. 86, 212106 (2005).
M. Zandian, A.C. Chen, D.D. Edwall, J.G. Pasko, and J.M. Arias, Appl. Phys. Lett. 71, 2815 (1997).
X.H. Zhang, J. Shao, L. Chen, X. Lü, S.L. Guo, L. He, and J.H. Chu, J. Appl. Phys. 110, 043503 (2011).
J. Shao, L. Chen, W. Lu, X. Lü, L.Q. Zhu, S.L. Guo, L. He, and J.H. Chu, Appl. Phys. Lett. 96, 121915 (2010).
F.Y. Yue, J.H. Chu, J. Wu, Z.G. Hu, Y.W. Li, and P.X. Yang, Appl. Phys. Lett. 92, 121916 (2008).
F.Y. Yue, J. Wu, and J.H. Chu, Appl. Phys. Lett. 93, 131909 (2008).
Y. Selamet, C.H. Grein, T.S. Lee, and S. Sivananthan, J. Vac. Sci. Technol. B 19, 1488 (2001).
I.I. Izhnin, S.A. Dvoretsky, N.N. Mikhailov, YuG Sidorov, V.S. Varavin, K.D. Mynbaev, and M. Pociask, Appl. Phys. Lett. 91, 132106 (2007).
M.A. Berding, A. Sher, M. Van Schilfgaarde, A.C. Chen, and J. Arias, J. Electron. Mater. 27, 605 (1998).
M.A. Berding and A. Sher, Appl. Phys. Lett. 45, 668 (1999).
M.A. Berding and A. Sher, Appl. Phys. Lett. 74, 685 (1999).
G. Kresse and J. Hafner, Phys. Rev. B 47, 558 (1993).
G. Kresse and J. Furthmüller, Comput. Mater. Sci. 6, 15 (1996).
D. Vanderbilt, Phys. Rev. B 41, 7892 (1990).
A. Rogalski, Rep. Prog. Phys. 68, 2267 (2005).
L.C. Davis and H. Holloway, Solid State Commun. 64, 121 (1987).
R. Alben, M. Blume, H. Krakauer, and L. Schwartz, Phys. Rev. B 12, 4090 (1975).
S.B. Zhang, S.-H. Wei, A. Zunger, and H. Katayama- Yoshida, Phys. Rev. B 57, 9642 (1998).
S.-H. Wei and S.B. Zhang, Phys. Rev. B 66, 155211 (2002).
F. Oba, S.R. Nishitani, S. Isotani, H. Adachi, and I. Tanaka, J. Appl. Phys. 90, 824 (2001).
C.H. Park, S.B. Zhang, and S.-H. Wei, Phys. Rev. B 66, 073202 (2002).
S. Limpijumnong, S.B. Zhang, S.-H. Wei, and C.H. Park, Phys. Rev. Lett. 92, 155504 (2004).
L.Z. Sun, X.S. Chen, Y.L. Sun, X.H. Zhou, Z.J. Quan, H. Duan, and W. Lu, Phys. Rev. B 71, 193203 (2005).
W.-J. Lee, J. Kang, and K.J. Chang, Phys. Rev. B 73, 024117 (2006).
A. Janotti, P. Reunchan, S. Limpijumnong, and C.G. Van de Walle, Phys. Rev. Lett. 100, 045505 (2008).
W.-J. Lee, J. Kang, and K.J. Chang, Phys. Rev. B 73, 024117 (2006).
J. Shao, X. Lü, S.L. Guo, W. Lu, L. Chen, Y. Wei, J. Yang, L. He, and J.H. Chu, Phys. Rev. B 80, 155125 (2009).
L. He, J.R. Yang, S.L. Wang, S.P. Guo, M.F. Yu, X.Q. Chen, W.Z. Fang, Y.M. Qiao, Q.Y. Zhang, R.J. Ding, and T.L. Xin, J. Cryst. Growth 175/176, 677 (1997).
J.W. Garland, C.H. Grein, B. Yang, P.S. Wijewarnasuriya, F. Aqariden, and S. Sivananthan, Appl. Phys. Lett. 74, 1975 (1999).
Fabio Bernardini and Vincenzo Fiorentini, Phys. Rev. B 61, 12598 (2000).
T.S. Lee, J. Garland, C.H. Grein, M. Sumstine, A. Jandeska, Y. Selamet, and S. Sivananthan, J. Electron. Mater. 29, 869 (2000).
Y. Selamet, G. Badano, C.H. Grein, P. Boieriu, V. Nathan, and S. Sivananthan, Proc. SPIE 4454, 71 (2001).
Acknowledgements
This work was supported by the Thousand Hundred Ten Projects in Guangdong Province, the National Natural Science Foundation of China (Grant No. 10847111), the Startup Project for PHD of GUT (Grant No. 083034), and the Fundamental Research Funds for the Central Universities of SCUT (Grant No. 2009ZM0022).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Duan, H., Dong, Y.Z., Huang, Y. et al. Model of V Hg Incorporation in Arsenic-Doped HgCdTe: First-Principles Calculations. J. Electron. Mater. 42, 1010–1016 (2013). https://doi.org/10.1007/s11664-013-2495-1
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-013-2495-1