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Photoelectrochemical properties of FTO/p-NiO electrode induced by UV light irradiation

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Abstract

Photoelectrochemical properties of p-nickel oxide (NiO) thin film deposited on fluorine-doped tin oxide (FTO) electrode, by combination of co-precipitation in aqueous media along with the dip-coating process, were investigated by cyclic voltammetry and chronoamperometry techniques in sodium sulfate (Na2SO4) electrolyte solution. The electrochemical characterization measurements have shown that the FTO/p-NiO electrode presents sensitivity to UV light, as observed by the increased photo-induced current, exposed to a more negative potential. The photoelectrochemical parameters obtained were photocurrent response time (∆t 1), photocurrent decay time (∆t 0), and photocurrent density stability (j ph, j light on − j light off). Besides, this electrode shows excellent performance for methylene blue degradation under UV light irradiation condition, with estimated k obs value of 170 × 10−4 min−1, which is nine times higher than the dark condition and about three times higher than NiO powder catalyst. Results presented here allow concluding that the p-NiO thin film stands as an important electrode material with technological potential to be used directly in environmental preservation.

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Acknowledgments

The authors wish to thank Prof. Margarida J. Saeki for the SEM images. They also acknowledge CNPq, FAPESP, and FUNDAÇÃO ARAUCÁRIA (15585/2010), NEMAN (Pronex, 17378/2009), for financial support.

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Authors and Affiliations

  1. Engineering College, CTI, UNESP–São Paulo State University, Bauru, São Paulo, Brazil

    Marcelo Rodrigues da Silva

  2. Department of Chemistry, UEL—State University of Londrina, Londrina, Parana, Brazil

    Vanildo Souza Leão Neto, Adriana Campano Lucilha & Luiz Henrique Dall’Antonia

  3. Department of Physics—FC, UNESP–São Paulo State University, Bauru, São Paulo, Brazil

    Luís Vicente de Andrade Scalvi

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  1. Marcelo Rodrigues da Silva
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  2. Vanildo Souza Leão Neto
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  3. Adriana Campano Lucilha
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  4. Luís Vicente de Andrade Scalvi
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  5. Luiz Henrique Dall’Antonia
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Correspondence to Marcelo Rodrigues da Silva.

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da Silva, M.R., Neto, V.S.L., Lucilha, A.C. et al. Photoelectrochemical properties of FTO/p-NiO electrode induced by UV light irradiation. Ionics 21, 1407–1415 (2015). https://doi.org/10.1007/s11581-014-1300-3

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  • DOI: https://doi.org/10.1007/s11581-014-1300-3

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