Plasmonics

, 6:565

Plasmonic Nanolithography: A Review

  • Zhihua Xie
  • Weixing Yu
  • Taisheng Wang
  • Hongxin Zhang
  • Yongqi Fu
  • Hua Liu
  • Fengyou Li
  • Zhenwu Lu
  • Qiang Sun
Article

DOI: 10.1007/s11468-011-9237-0

Cite this article as:
Xie, Z., Yu, W., Wang, T. et al. Plasmonics (2011) 6: 565. doi:10.1007/s11468-011-9237-0

Abstract

Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

Keywords

Plasmonic nanolithographyContact nanolithographyPlanar lens imaging nanolithography

Copyright information

© Springer Science+Business Media, LLC 2011

Authors and Affiliations

  • Zhihua Xie
    • 1
    • 2
  • Weixing Yu
    • 3
  • Taisheng Wang
    • 1
    • 2
  • Hongxin Zhang
    • 1
  • Yongqi Fu
    • 4
  • Hua Liu
    • 1
  • Fengyou Li
    • 1
  • Zhenwu Lu
    • 1
  • Qiang Sun
    • 1
  1. 1.Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of SciencesChangchunChina
  2. 2.Graduate School of the Chinese Academy of SciencesBeijingChina
  3. 3.State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of SciencesChangchunChina
  4. 4.School of Physical ElectronicsUniversity of Electronic Science and Technology of ChinaChengduPeople’s Republic of China