Article

Plasmonics

, Volume 6, Issue 3, pp 565-580

Plasmonic Nanolithography: A Review

  • Zhihua XieAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of SciencesGraduate School of the Chinese Academy of Sciences
  • , Weixing YuAffiliated withState Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences Email author 
  • , Taisheng WangAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of SciencesGraduate School of the Chinese Academy of Sciences
  • , Hongxin ZhangAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
  • , Yongqi FuAffiliated withSchool of Physical Electronics, University of Electronic Science and Technology of China Email author 
  • , Hua LiuAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
  • , Fengyou LiAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
  • , Zhenwu LuAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
  • , Qiang SunAffiliated withOpto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences

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Abstract

Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

Keywords

Plasmonic nanolithography Contact nanolithography Planar lens imaging nanolithography