Plasmonics

, 6:565

Plasmonic Nanolithography: A Review

Authors

  • Zhihua Xie
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
    • Graduate School of the Chinese Academy of Sciences
    • State Key Laboratory of Applied Optics, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
  • Taisheng Wang
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
    • Graduate School of the Chinese Academy of Sciences
  • Hongxin Zhang
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
    • School of Physical ElectronicsUniversity of Electronic Science and Technology of China
  • Hua Liu
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
  • Fengyou Li
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
  • Zhenwu Lu
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
  • Qiang Sun
    • Opto-electronic Technology Center, Changchun Institute of Optics, Fine Mechanics and PhysicsChinese Academy of Sciences
Article

DOI: 10.1007/s11468-011-9237-0

Cite this article as:
Xie, Z., Yu, W., Wang, T. et al. Plasmonics (2011) 6: 565. doi:10.1007/s11468-011-9237-0

Abstract

Surface plasmon polaritons (SPPs) has attracted great attention in the last decade and recently it has been successfully applied to nanolithography due to its ability of beyond diffraction limit. This article reviews the recent development in plasmonic nanolithography, which is considered as one of the most remarkable technology for next-generation nanolithography. Nanolithography experiments were highlighted on the basis of SPPs effect. Three types of plasmonic nanolithography methods: contact nanolithography, planar lens imaging nanolithography, and direct writing nanolithography were reviewed in detail, and their advantages and shortages are analyzed and compared, respectively. Finally, the development trend of plasmonic nanolithography is suggested.

Keywords

Plasmonic nanolithography Contact nanolithography Planar lens imaging nanolithography

Copyright information

© Springer Science+Business Media, LLC 2011