Skip to main content
Log in

Effects of pH and Oxidizer on Chemical Mechanical Polishing of AISI 1045 Steel

  • Original Paper
  • Published:
Tribology Letters Aims and scope Submit manuscript

Abstract

AISI 1045 steel has been widely used as the substrate for thin film deposition. In some cases, an ultra-smooth surface of AISI 1045 steel is needed and is even indispensible for the satisfactory deposition of thin film. In this paper, chemical mechanical polishing technique was employed to prepare the ultra-smooth surface of AISI 1045 steel. The effects of pH and H2O2 on the polishing performance of AISI 1045 steel were investigated. It is revealed that, with the increase of pH, the material removal rate (MRR) and the static etching rate (SER) of AISI 1045 steel gradually decrease due to the formation of passive iron oxides on the top surface, and thus the surface quality gradually improves. At pH 4.00, with the addition of H2O2, the SER of AISI 1045 steel is further suppressed; while the MRR of AISI 1045 steel first dramatically increases due to the formation of porous iron oxides with relatively low mechanical strength on the surface when the H2O2 concentration increases from 0 to 0.01 wt%, and then decreases since the porous iron oxides gradually grow compact when the H2O2 concentration further increases. The increase of the compactness of the iron oxides might be attributed to the crystallization of γ-FeOOH into α-FeOOH and even into α-Fe2O3 and the resulting polymerization of the amorphous iron oxides.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7

Similar content being viewed by others

References

  1. Contreras, G., Fajardo, C., Berríos, J., Pertuz, A., Chitty, J., Hintermann, H., Puchi, E.: Fatigue properties of an AISI 1045 steel coated with an electroless Ni–P deposit. Thin Solid Films 355, 480–486 (1999)

    Article  Google Scholar 

  2. Su, Y., Yao, S., Wei, C., Kao, W., Wu, C.: Influence of single- and multilayer TiN films on the axial tension and fatigue performance of AISI 1045 steel. Thin Solid Films 338(1), 177–184 (1999)

    Article  Google Scholar 

  3. Ahn, S., Yoo, J., Choi, Y., Kim, J., Han, J.: Corrosion behavior of PVD-grown WC–(Ti1−xAlx)N films in a 3.5 % NaCl solution. Surf. Coat. Technol. 162(2), 212–221 (2003)

    Article  Google Scholar 

  4. Qingliang, W., Yanmin, S., Lei, Z.: Tribological properties of diamond-like carbon films deposited by PECVD. Chi. J. Mater. Res. 25(1), 73–78 (2011). (in Chinese)

    Google Scholar 

  5. Wang, Y.-R., Wang, Y.-Q., Hui, Z.-P., Song, J.-I.: Mechanical properties of AISI 1045 ceramic coated materials by nano indentation and crack opening displacement method. J. Central South Univ. 19(11), 3023–3027 (2012)

    Article  Google Scholar 

  6. Aperador, W., Caicedo, J.C., España, C., Cabrera, G., Amaya, C.: Bilayer period effect on corrosion–erosion resistance for [TiN/AlTiN]n multilayered growth on AISI 1045 steel. J. Phys. Chem. Solids 71(12), 1754–1759 (2010)

    Article  Google Scholar 

  7. Li-na, Z., Cheng-biao, W., Hai-dou, W., Bin-shi, X., Da-ming, Z., Jia-jun, L., Guo-lu, L.: Tribological properties of WS2 composite film prepared by a two-step method. Vacuum 85(1), 16–21 (2010)

    Article  Google Scholar 

  8. Caicedo, J.C., Cabrera, G., Caicedo, H.H., Amaya, C., Aperador, W.: Nature in corrosion–erosion surface for [TiN/TiAlN]n nanometric multilayers growth on AISI 1045 steel. Thin Solid Films 520(13), 4350–4361 (2012)

    Article  Google Scholar 

  9. Peng, D.-X.: Chemical mechanical polishing of steel substrate using aluminum nanoparticles abrasive slurry. Ind. Lubr. Tribol. 66(1), 124–130 (2014)

    Article  Google Scholar 

  10. Hu, X., Song, Z., Liu, W., Qin, F., Zhang, Z., Wang, H.: Chemical mechanical polishing of stainless steel foil as flexible substrate. Appl. Surf. Sci. 258(15), 5798–5802 (2012)

    Article  Google Scholar 

  11. Lee, S.-J., Chen, Y.-H., Hu, S.-C., Lin, Y.-C., Chang, J.-W., Poon, T.-L., Ke, W.-C.: Improved performance of amorphous Si thin-film solar cells on 430 stainless steel substrate by an electrochemical mechanical polishing process. J. Alloys Compd. 558, 95–98 (2013)

    Article  Google Scholar 

  12. Li, Y.: Microelectronic applications of chemical mechanical planarization. Wiley, Hoboken (2007)

    Book  Google Scholar 

  13. Zhao, D., Lu, X.: Chemical mechanical polishing: theory and experiment. Friction 1(4), 306–326 (2013)

    Article  Google Scholar 

  14. Zhang, W., Lei, H.: Abrasive-free polishing of hard disk substrate with H2O2-C4H10O2-Na2S2O5 slurry. Friction 1(4), 359–366 (2013)

    Article  Google Scholar 

  15. He, X., Chen, Y., Zhao, H., Sun, H., Lu, X., Liang, H.: Y2O3 nanosheets as slurry abrasives for chemical–mechanical planarization of copper. Friction 1(4), 327–332 (2013)

    Article  Google Scholar 

  16. Ahn, Y., Yoon, J.-Y., Baek, C.-W., Kim, Y.-K.: Chemical mechanical polishing by colloidal silica-based slurry for micro-scratch reduction. Wear 257(7–8), 785–789 (2004)

    Article  Google Scholar 

  17. Xiangfeng, C., Xiujin, L., Yongping, D., Wangbing, Z., Linshan, B.: Investigation of CMP of Ni in the preparation process of micro-electro-mechanical system devices. Rare Metal Mater Eng 41(4), 585–588 (2012)

    Article  Google Scholar 

  18. Lei, H., Luo, J.: CMP of hard disk substrate using a colloidal SiO2 slurry: preliminary experimental investigation. Wear 257(5–6), 461–470 (2004)

    Article  Google Scholar 

  19. Peethala, B.C., Amanapu, H.P., Lagudu, U.R.K., Babu, S.V.: Cobalt polishing with reduced galvanic corrosion at copper/cobalt interface using hydrogen peroxide as an oxidizer in colloidal silica-based slurries. J. Electrochem. Soc. 159(6), H582–H588 (2012)

    Article  Google Scholar 

  20. Jindal, A., Babu, S.: Effect of pH on CMP of copper and tantalum. J. Electrochem. Soc. 151(10), G709–G716 (2004)

    Article  Google Scholar 

  21. Nishizawa, H., Nojo, H., Isobe, A.: Fundamental study of chemical–mechanical polishing slurry of cobalt barrier metal for the next-generation interconnect process. Jpn. J. Appl. Phys. 49(5), 05FC03-01-05FC03-02 (2010)

  22. Teugels, L., Eynde, M.V.D., Delande, T., Leunissen, P.: Chemical mechanical polishing of nickel for damascene applications. In: Clarkson University 17th International Symposium on Chemical Mechanical Planarization, Lake Placid, NY, USA 2012

  23. Li, J., Chai, Z., Liu, Y., Lu, X.: Tribo-chemical behavior of copper in chemical mechanical planarization. Tribol. Lett. 50(2), 177–184 (2013)

    Article  Google Scholar 

  24. Du, T., Vijayakumar, A., Sundaram, K.B., Desai, V.: Chemical mechanical polishing of nickel for applications in MEMS devices. Microelectron. Eng. 75(2), 234–241 (2004)

    Article  Google Scholar 

  25. Beverskog, B., Puigdomenech, I.: Revised Pourbaix diagrams for iron at 25–300 °C. Corros. Sci. 38(12), 2121–2135 (1996)

    Article  Google Scholar 

  26. Vesel, A., Mozetič, M., Zalar, A.: Oxidation of AISI 304L stainless steel surface with atomic oxygen. Appl. Surf. Sci. 200(1), 94–103 (2002)

    Article  Google Scholar 

  27. Deshpande, S., Kuiry, S.C., Klimov, M., Seal, S.: Elucidating Cu-glycine and BTA complexations in Cu-CMP using SIMS and XPS. Electrochem. Solid-State Lett. 8(4), G98–G101 (2005)

    Article  Google Scholar 

  28. Yulan, R., Jingmin, Y., Yinghua, L., Yingli, W.: Inhibition behavior and mechanism of molybdate compound inhibitor for carbon steel in sea water. Environ. Sci. Technol. 30(4), 23–25 (2007). (in Chinese)

    Google Scholar 

  29. Wilson, D., Langell, M.A.: XPS analysis of oleylamine/oleic acid capped Fe3O4 nanoparticles as a function of temperature. Appl. Surf. Sci. 303, 6–13 (2014)

    Article  Google Scholar 

  30. Graat, P.C.J., Somers, M.A.J.: Simultaneous determination of composition and thickness of thin iron-oxide films from XPS Fe 2p spectra. Appl. Surf. Sci. 100–101, 36–40 (1996)

    Article  Google Scholar 

  31. Jie, D., Junhua, D., Enhou, H., Chunming, L., Wei, K.: Rusting evolvement of mild steel under wet/dry cyclic condition with pH 4.00 NaHSO3 solution. Corros. Sci. Prot. Technol. 21(1), 1–4 (2009). (in Chinese)

    Google Scholar 

  32. Joong Kim, K., Moon, D.W., Lee, S.K., Jung, K.-H.: Formation of a highly oriented FeO thin film by phase transition of Fe3O4 and Fe nanocrystallines. Thin Solid Films 360(1–2), 118–121 (2000)

    Article  Google Scholar 

  33. Gao, X., Wu, X., Zhang, Z., Guan, H., Han, E.-H.: Characterization of oxide films grown on 316L stainless steel exposed to H2O2-containing supercritical water. J. Supercrit. Fluids 42(1), 157–163 (2007)

    Article  Google Scholar 

  34. Choi, S., Tripathi, S., Dornfeld, D.A., Doyle, F.M.: Copper CMP modeling: millisecond scale adsorption kinetics of BTA in glycine-containing solutions at pH 4. J. Electrochem. Soc. 157(12), H1153–H1159 (2010)

    Article  Google Scholar 

  35. Junhua, D., Wei, K.: The accelerated test of simulated atmospheric corrosion and the rust evolution of low carbon steel. Electrochemistry 15(2), 170–178 (2009). (in Chinese)

    Google Scholar 

  36. Chao, Y., Huixia, Z., Weimin, G., Yubin, F.: Effects of H2O2 addition on corrosion behavior of high-strength low-alloy steel in seawater. J. Chin. Soc. Corros. Protect. 33(003), 205–210 (2013). (in Chinese)

    Google Scholar 

  37. Xiaofang, Y., Wenlong, Z.: Analysis on the corrosion rust of weathering steel and carbon steel exposed to atmosphere for two years. Corros. Prot. 23(3), 97–98 (2002). (in Chinese)

    Google Scholar 

Download references

Acknowledgments

The authors would like to thank the financial support of NSFC of China (51321092 and 51275263) and the State Key Development Program for Basic Research of China (Grant No. 2014CB046404).

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Jianbin Luo.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Jiang, L., He, Y. & Luo, J. Effects of pH and Oxidizer on Chemical Mechanical Polishing of AISI 1045 Steel. Tribol Lett 56, 327–335 (2014). https://doi.org/10.1007/s11249-014-0412-2

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11249-014-0412-2

Keywords

Navigation