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Deposition Processes with Hardcore Behaviour

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Abstract

Particles are deposited onto a surface with discrete sites. They are subject to an inhibition by which they cannot pass close by a particle already fixed on the surface. This implies that the surface builds up with vertical gaps between the particles. In this paper it is shown that there is a limiting rate at which the surface grows, and that this is related to the “roughness” of the surface.

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Correspondence to Thomas S. Mountford.

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Mountford, T.S., Sudbury, A. Deposition Processes with Hardcore Behaviour. J Stat Phys 146, 687–700 (2012). https://doi.org/10.1007/s10955-011-0415-4

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  • DOI: https://doi.org/10.1007/s10955-011-0415-4

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