Singh, R., Singh, D.P. & Yadav, R.A. J Russ Laser Res (2013) 34: 185. doi:10.1007/s10946-013-9341-z
Photorefractive response time and photorefractive sensitivity are two important parameters characterizing photorefractive materials. We study theoretically the effect of the grating spacing on these parameters at large modulation depth in the absence and presence of an applied electric field for some of the most promising photorefractive materials, namely, LiNbO3, KNSBN, SPS, BGO, and GaAs. We find that the response time increases with increasing grating spacing for LiNbO3 and KNSBN, whereas the response time decreases with increasing grating spacing for SPS, BGO, and GaAs. The photorefractive sensitivity is mainly affected by the mobility–lifetime product in the presence of an applied electric field.
photorefractive response timephotorefractive sensitivitygrating spacingapplied electric fieldmobility–lifetime product