Skip to main content
Log in

Application of Plasma Focus Device in Fast Industrial Radiography

  • Original Research
  • Published:
Journal of Fusion Energy Aims and scope Submit manuscript

Abstract

This paper deals with application of the plasma focus (PF) devices in fast industrial radiography. The results of radiography of a fan unit in both static and rotating states are presented. To do this, an X-ray video camera and the hard X-ray emission due to a PF device have been used. Moreover, the gray levels of the radiograph have been employed to find out the average effective X-ray energy in radiography of the rotating fan.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5

Similar content being viewed by others

Notes

  1. Gadolinium oxide sulfide (Gd2O2S).

  2. Charge coupled device.

  3. Digital video recorder.

References

  1. R. Halmshaw, Industrial Radiology Techniques (Wykeham Publications, London, 1971). ISBN: 0 85109 2101

  2. M. Zakaullah et al., Scope of plasma focus with argon as a soft X-ray source. IEEE Trans. Plasma Sci. 6, 2089–2094 (2002)

    Article  ADS  Google Scholar 

  3. S. Hussain et al., Plasma focus as a high intensity flash X-ray source for biological radiography. J. Fusion Energ. 22(3), 195–200 (2003)

    Article  ADS  Google Scholar 

  4. M. Barbaglia, et al., Experimental study of the hard X-ray emissions in a plasma focus of hundreds of Joules. Plasma Phys. Control 51(4) (2009). doi:10.1088/0741-3335/51/4/045001

  5. J. Feugeas et al., Nitrogen implantation of AISI 304 stainless steel with a coaxial plasma gun. J. Appl. Phys. 64(5), 2648–2651 (1988)

    Article  ADS  Google Scholar 

  6. P. Lee et al., Electron lithography using a compact plasma focus. Plasma Sources Sci. Technol. 6(3), 343–348 (1997)

    Article  ADS  Google Scholar 

  7. F. Castillo et al., Small plasma focus studied as a source of hard X-ray. IEEE Trans. Plasma Sci. 29(6), 921–926 (2001)

    Article  ADS  Google Scholar 

  8. M.A. Tafreshi et al., Studies of the hard X-ray emission from the Filippov type plasma focus device, Dena. J. Fusion Energ. 25, 207–211 (2006)

    Article  ADS  Google Scholar 

  9. L. Soto, New trends and future perspectives of plasma focus research. Plasma Phys. Control. Fusion 47, 361–381 (2005)

    Article  ADS  Google Scholar 

  10. M.A. Tafreshi et al., Dena, a new PF device. Nukleonika 46(Suppl 1), 85–87 (2001)

    Google Scholar 

  11. V. Raspa et al., Plasma focus as a powerful hard X-ray source for ultrafast imaging of moving metallic objects. Braz. J. Phys. 34(4B), 1696–1699 (2004)

    Article  ADS  Google Scholar 

  12. http://physics.nist.gov/PhysRefData/XrayMassCoef/tab3.html

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to M. A. Tafreshi.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Tafreshi, M.A., Nasseri, M.M., Nabipour, N. et al. Application of Plasma Focus Device in Fast Industrial Radiography. J Fusion Energ 33, 689–692 (2014). https://doi.org/10.1007/s10894-014-9734-1

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10894-014-9734-1

Keywords

Navigation