Skip to main content
Log in

Preparation of Si powder thick films by low frequency alternating electrophoretic deposition

  • Letter
  • Published:
Journal of Materials Science Aims and scope Submit manuscript

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3

References

  1. Boccaccini AR, Cho J, Roether JA, Thomas BJC, Minay EJ, Shaffer MSP (2006) Carbon 44:3149

    Article  CAS  Google Scholar 

  2. Wang L, Chen Y, Chen T, Que W, Sun Z (2006) Mater Lett 61:1265

    Article  Google Scholar 

  3. Du C, Pan N (2006) J Power Sources 160:1487

    Article  Google Scholar 

  4. Popa AM, Vleugels J, Vermant J, Van der Biest O (2006) J Eur Ceram Soc 26:933

    Article  CAS  Google Scholar 

  5. Hossein-Babaei F, Raissi-Dehkordi B (2001) Electron Lett 37:1090

    Article  CAS  Google Scholar 

  6. Hosseinbabaei F, Raissidehkordi B (1999) In: Proceedings of the ninth CIMTEC, vol 20. Florence, pp 65–70

  7. Gardeshzadeh AR, Raissi B, Marzbanrad E (2008) Mater Lett 62:1697

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Babak Raissi.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Gardeshzadeh, A.R., Raissi, B. & Marzbanrad, E. Preparation of Si powder thick films by low frequency alternating electrophoretic deposition. J Mater Sci 43, 2507–2508 (2008). https://doi.org/10.1007/s10853-008-2519-z

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s10853-008-2519-z

Keywords

Navigation