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Electrochemical deposition of Cu and Ta from pyrrolidinium based ionic liquid

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Abstract

The electrochemical deposition of tantalum and copper has been investigated in 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide ([BMP][TFSA]) on both boron doped diamond (BDD) and copper substrates in order to realize nanometric Cu–Ta bilayer deposits. Electrochemical experiments have been performed at 125 °C in a glove box, under nitrogen atmosphere. Galvanostatic runs and cyclic voltammograms performed at different scan rates have been carried out in order to determine the electroreduction path for tantalum and copper. Potentiostatic experiments were performed at the potential values corresponding to the voltammetric peaks and the samples obtained were analysed by SEM-EDX analyses. For both metals nanometric crystallites have been obtained. Cu–Ta deposits have been prepared by a dual bath technique and were constituted by fine crystallites with average sizes in the range 50–100 nm. The elemental maps indicate a different distribution of Cu–Ta depending on the substrates.

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Acknowledgments

This activity is supported by the European Community Framework Programme 7, Multiscale Modelling and Materials by Design of interface-controlled Radiation Damage in Crystalline Materials (RADINTERFACES), under Grant agreement n. 263273. Laura Mais acknowledges Regione Sardegna for the PhD fellowship (POR FSE 2007–2013). The authors kindly acknowledge Dr. Elodia Musu and Dr. Simona Podda, Laboratorio Telemicroscopia Industriale—CRS4, for SEM analyses.

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Authors and Affiliations

  1. Dipartimento di Ingegneria Meccanica, Chimica e dei Materiali, Università degli Studi di Cagliari, via Marengo 3, 09123, Cagliari, Italy

    Laura Mais, Michele Mascia, Annalisa Vacca, Simonetta Palmas & Francesco Delogu

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  1. Laura Mais
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  2. Michele Mascia
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  3. Annalisa Vacca
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  4. Simonetta Palmas
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  5. Francesco Delogu
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Correspondence to Annalisa Vacca.

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Mais, L., Mascia, M., Vacca, A. et al. Electrochemical deposition of Cu and Ta from pyrrolidinium based ionic liquid. J Appl Electrochem 45, 735–744 (2015). https://doi.org/10.1007/s10800-015-0824-1

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  • DOI: https://doi.org/10.1007/s10800-015-0824-1

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