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Electrodeposition of bismuth, tellurium, and bismuth telluride thin films from choline chloride–oxalic acid ionic liquid

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Abstract

This article presents a series of preliminary results regarding the electrodeposition of bismuth, tellurium, and bismuth telluride films at 60 °C from ionic liquids, containing a mixture of choline chloride and oxalic acid (ChCl–OxA). Ten millimolar concentration solutions of BiCl3 and TeO2 were used as precursors in this supporting electrolyte. Cyclic voltammetry and electrochemical impedance spectroscopy techniques were used to demonstrate the deposition processes on Pt and Cu electrodes. Long-time electrolyses (30–120 min) performed at 60 °C with potential control (between −0.22 and −0.37 V vs. Ag reference electrode) have resulted in films deposited on copper substrate. Film surfaces were studied by scanning electron microscopy and analyzed by energy dispersive X-ray spectroscopy. The results of this study show that ChCl–OxA ionic liquid may be considered as a promising substitute of aqueous baths for Bi, Te or Bi2Te3 film plating.

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Acknowledgments

The support of the European Social Fund through POSDRU/88/1.5/S/60203 Project is acknowledged by the first author.

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Authors and Affiliations

  1. Department of Inorganic Chemistry, Physical Chemistry and Electrochemistry, University POLITEHNICA of Bucharest, Calea Grivitei 132, 010737, Bucharest, Romania

    Camelia Agapescu, Anca Cojocaru, Adina Cotarta & Teodor Visan

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  1. Camelia Agapescu
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  2. Anca Cojocaru
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  3. Adina Cotarta
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  4. Teodor Visan
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Correspondence to Anca Cojocaru.

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Agapescu, C., Cojocaru, A., Cotarta, A. et al. Electrodeposition of bismuth, tellurium, and bismuth telluride thin films from choline chloride–oxalic acid ionic liquid. J Appl Electrochem 43, 309–321 (2013). https://doi.org/10.1007/s10800-012-0487-0

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  • DOI: https://doi.org/10.1007/s10800-012-0487-0

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