Catalysis Letters

, Volume 98, Issue 1, pp 23–28

Comparison of Two Preparation Methods in the Redox Properties of Pd/CeO2/Ta/Si Model Catalysts: Spin Coating Versus Sputter Deposition

Authors

  • Do Heui Kim
    • Department of Chemical and Biomolecular Engineering, and Center for Ultramicrochemical Process Systems, KoreaAdvanced Institute Science and Technology (KAIST)
    • Chemistry and Physics Science DivisionPacific Northwest National Laboratory
  • Seong Ihl Woo
    • Department of Chemical and Biomolecular Engineering, and Center for Ultramicrochemical Process Systems, KoreaAdvanced Institute Science and Technology (KAIST)
Article

DOI: 10.1007/s10562-004-6443-9

Cite this article as:
Kim, D.H. & Woo, S.I. Catalysis Letters (2004) 98: 23. doi:10.1007/s10562-004-6443-9

Abstract

Pd/CeO2/Ta/Si model catalysts were prepared by spin coating and sputter deposition method, and characterized by means of AFM, SEM and in situ XPS, especially focusing on the redox properties of Ce and Pd elements. Compared with thin CeO2 films (about 2.2nm), the thicker ones (about 22nm) maintained Ce4+ oxidation state even after treatment with H2 up to 500°C while the presence of Pd facilitated the reduction of ceria. The reduction of ceria brought about following that of PdO, which was explained by the spillover of hydride in Pd to CeO2 originating from hydrogen adsorption on the Pd surface. Compared with the sputter deposition method, spin coating produced the smaller size of Pd particles, thus leading to formation of the stable PdO species against hydrogen. Based on these results, a schematic model of Pd/CeO2/Ta/Si was suggested and it might be assumed that spin coating method provided with an environment similar to the conventional impregnation.

AFMCeO2model catalystPdspin coatingsputter depositionXPS
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Copyright information

© Plenum Publishing Corporation 2004