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Recent progress in low temperature nanoimprint lithography

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Abstract

Nanoimprint lithography is a low cost and high throughput technology to fabricate nanostructures with excellent resolution. However, traditional thermal nanoimprint limits its application field because high temperature induces many problems. Low temperature nanoimprint lithography, including ultraviolet nanoimprint lithography and room temperature nanoimprint lithography, can reduce or remove thermal cycle, overcome the sticking problem, alleviate the alignment errors due to different coefficients of thermal expansion and pattern polymer based materials that are intolerant to high temperature. Recent development of these three low temperature NIL techniques was discussed from the aspects of new resist, stamp, process and application. Low temperature nanoimprint has wide application in the fields of optoelectronics, displays and bio-applications.

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Authors and Affiliations

  1. College of Internet of Things, Hohai University, 200 JinLing Road North, Changzhou, 213022, China

    Hongwen Sun

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  1. Hongwen Sun
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Correspondence to Hongwen Sun.

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Sun, H. Recent progress in low temperature nanoimprint lithography. Microsyst Technol 21, 1–7 (2015). https://doi.org/10.1007/s00542-014-2366-6

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  • DOI: https://doi.org/10.1007/s00542-014-2366-6

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