Abstract
We processed a precise relief structure on the surface of a glass-like carbon (GC) substrate by applying micro-electro-mechanical-systems (MEMS) technologies, and made a high temperature resistant mold for thermal imprinting on glass materials. An attractive feature of GC is its chemical stability at high temperatures (above 1,000 °C). The down side is its brittleness that makes microfabrication with GC a difficult task. We investigated to find if photolithography combined with reactive-ion-etching (RIE), which are generally used in MEMS fabrication, could be applied for the fabrication of GC molds. In our work with the RIE process, we made masking layers using Au and a positive-tone photoresist. By taking advantage of the difference between the etching rates of the masking materials and GC, we fabricated convex mold patterns with vertical and curved sidewalls. From the experimental results imprinted on Pyrex glass and on quartz, the practicability of using both kinds of GC molds appeared to be quite promising. We believe that in the near future these techniques will be successfully applied in the fabrication of large-size GC molds.
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Mekaru, H., Okuyama, C. & Ueno, A. Fabrication of glass-like carbon molds to imprint on glass materials by MEMS processing technologies. Microsyst Technol 19, 315–323 (2013). https://doi.org/10.1007/s00542-012-1553-6
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DOI: https://doi.org/10.1007/s00542-012-1553-6