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Quantum lithography: A non-computing application of quantum information

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Informatik - Forschung und Entwicklung

Abstract

Quantum information theory holds the promise of revolutionizing technologies other than computing and communications. In this article we show how quantum entanglement can be harnessed to beat the Rayleigh diffraction limit of conventional optical lithography, and to permit nano-devices to be fabricated at a scale arbitrarily shorter than the wavelength used. Given the relative ease of performing optical lithography compared with other schemes, and the relative costs associated in migrating the lithography industry to each new fabrication technology, exploiting quantum entanglement to extend the useful life of optical lithography could be economically attractive.

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Authors and Affiliations

  1. Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, 91109–8099, Pasadena, CA, USA

    Colin Williams & Jonathan P. Dowling

  2. Department of Materials, Oxford University, Oxford University Parks Road, OX1 3PH, Oxford, UK

    Pieter Kok

  3. Department of Physics & Astronomy, Louisiana State University, 202 Nicholson Hall, Tower Drive, 70803–4001, Baton Rouge, LA, USA

    Hwang Lee & Jonathan P. Dowling

Authors
  1. Colin Williams
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  2. Pieter Kok
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  3. Hwang Lee
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  4. Jonathan P. Dowling
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Correspondence to Colin Williams.

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Williams, C., Kok, P., Lee, H. et al. Quantum lithography: A non-computing application of quantum information . Informatik Forsch. Entw. 21, 73–82 (2006). https://doi.org/10.1007/s00450-006-0017-6

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  • DOI: https://doi.org/10.1007/s00450-006-0017-6

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