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Asymmetric orientational writing dependence on polarization and direction in Li2O–Nb2O5–SiO2 glass with femtosecond laser irradiation

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Abstract

Strong birefringence photo-induced by the femtosecond laser irradiation and a sensitivity to the orientation of the laser movement versus the laboratory reference (i.e., difference between rightward and leftward or between upward and downward) have been demonstrated in 32.5Li2O–27.5Nb2O5–40SiO2 glass. An asymmetry with the orientation of the laser scanning was firstly observed by one of the authors in 2003 in pure silica (Poumellec et al. in Opt Express 11:1070, 2003). Here, we show in addition that this asymmetric orientational sensitivity is dependent on the direction of laser polarization and the laser scanning (i.e., when the direction is horizontal or vertical). In particular, no asymmetric writing is detected when both laser scanning and polarization directions are vertical. These observations are not explained by the available model.

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Acknowledgments

This work has been done in the frame of FLAG (Femtosecond Laser Application in Glasses) consortium project with the support of several organizations: the Agence Nationale pour la Recherche (ANR-09-BLAN-0172-01), the RTRA Triangle de la Physique (2008-056T), the FP7-PEOPLE-IIF FemtoNano 908582, Shanghai Leading Academic Discipline Project (No. B502), Shanghai Key Laboratory Project (08DZ2230500), the National Natural Science Foundation of China (NSFC51072052), the Natural Science Foundation of Shanghai (12ZR1407600), and the Fundamental Research Funds for the Central Universities (WD1014035).

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Authors and Affiliations

  1. Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai, 200237, China

    Chaxing Fan, Huidan Zeng & Guorong Chen

  2. Institut de Chimie Moléculaire et des Matériaux d’Orsay (ICMMO), UMR CNRS-PSUD, 8182 Bâtiment 410, Université de Paris Sud 11, 91405, Orsay, France

    Chaxing Fan, Bertrand Poumellec, Rudy Desmarchelier & Matthieu Lancry

  3. Institut des Sciences Moléculaires d’Orsay, UPR CNRS 3361, Bâtiment 350, Université de Paris Sud 11, 91405, Orsay, France

    Bernard Bourguignon

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  1. Chaxing Fan
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  2. Bertrand Poumellec
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  4. Huidan Zeng
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  5. Bernard Bourguignon
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  7. Matthieu Lancry
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Correspondence to Bertrand Poumellec.

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Fan, C., Poumellec, B., Desmarchelier, R. et al. Asymmetric orientational writing dependence on polarization and direction in Li2O–Nb2O5–SiO2 glass with femtosecond laser irradiation. Appl. Phys. B 117, 737–747 (2014). https://doi.org/10.1007/s00340-014-5889-8

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