Abstract
Fabrication and stitching of internal 2D, 1D and multi-layer micro-gratings in fused silica glass using amplified Ti:sapphire femtosecond laser were reported. These gratings have the pitch of 4 μm and the size of 400 μm×400 μm. For a two-layer 1D micro-grating where a second-layer grating was overwritten on a first-layer grating at the exact X,Y position and the different Z depth, the diffraction efficiency can reach more than 25% due to the grating thickness increase. If a second-layer grating was stitched with a first-layer by the shift of 2 μm in the X direction and at the different Z depth, the diffraction angle was doubled but the diffraction efficiency was about 9%. The last result has the potential application for fabricating high-density micro-/nano-structures beyond the diffraction limit through 3D stitching.
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42.79.Dj; 42.40.Lx; 42.62.Cf
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Liu, J., Zhang, Z., Lu, Z. et al. Fabrication and stitching of embedded multi-layer micro-gratings in fused silica glass by fs laser pulses. Appl. Phys. B 86, 151–154 (2007). https://doi.org/10.1007/s00340-006-2432-6
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DOI: https://doi.org/10.1007/s00340-006-2432-6