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Effect of post-annealing temperature on structure and optical properties of Zn1−x Cd x O thin films synthesized by magnetron sputtering

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Abstract

The Zn1−x Cd x O (x = 0.5) thin film was grown on quartz by the direct current reactive magnetron sputtering and post-annealing techniques. The influence of annealing temperature (T a) on the structure and optical properties of Zn1−x Cd x O thin film was investigated by using X-ray diffraction (XRD), photoluminescence and optical absorbance measurements. The XRD results indicate that the as-grown Zn1−x Cd x O thin film is of highly (002)-preferred orientation and possessing the hexagonal wurtzite structure of pure ZnO, as the T a increases up from 300 to 600 °C, the phase segregation as cubic CdO was observed. The detailed microstructures of the Zn1−x Cd x O thin film were investigated by transmission electron microscopy. Moreover, with the increase of T a, the optical band gap of the Zn1−x Cd x O thin films increased from 2.08 to 3.14 eV. Correspondingly, the near-band-edge photoluminescence was tuned in a wide visible region from ~588 to 403 nm.

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Acknowledgments

The authors would like to thank financial support of the National Natural Science Foundation of China under Grant Nos. 11254001, 61505067, 61475063, 11204104, the Program for the development of Science and Technology of Jilin province Grant No. 20150520086JH, the Program for New Century Excellent Talents in University Grant No. NCET-13-0824.

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Correspondence to Yingrui Sui or Jinghai Yang.

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Sui, Y., Song, Y., Yue, Y. et al. Effect of post-annealing temperature on structure and optical properties of Zn1−x Cd x O thin films synthesized by magnetron sputtering. Appl. Phys. A 122, 766 (2016). https://doi.org/10.1007/s00339-016-0297-z

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  • DOI: https://doi.org/10.1007/s00339-016-0297-z

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