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Line width tuning and smoothening for periodical grating fabrication in nanoimprint lithography

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Abstract

Nanoimprint lithography is a promising technology for patterning large-area structures in nanometer scale at a low cost. In order to fabricate large-area nanoimprint master mold, interference lithography is widely used in defining periodical structures. However, neither roughness nor structural dimension can be effectively controlled via interference exposure. In this paper, we report a fabrication technique based on V-shaped master mold that can adjust line width of gratings as well as reduce the sidewall roughness. The fabrication of the V-shaped grating master mold is demonstrated, and the line width tuning and smoothening processes are discussed. With the help of the smoothening process, the optical efficiency of smoothened guided-mode resonance grating increased by 75 % from the original sample.

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References

  1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Nanoimprint lithography. J. Vac. Sci. Technol. B Microelectron. Nanometer Struct. 14(6), 4129–4133 (1996)

    Article  ADS  Google Scholar 

  2. V. Karagodsky, F.G. Sedgwick, C.J. Chang-Hasnain, Theoretical analysis of subwavelength high contrast grating reflectors. Opt. Express 18(16), 16973–16988 (2010)

    Article  ADS  Google Scholar 

  3. Y. Yao, H. Liu, W. Wu, Spectrum splitting using multi-layer dielectric meta-surfaces for efficient solar energy harvesting. Appl. Phys. A 115(3), 713–719 (2014)

    Article  ADS  Google Scholar 

  4. Y. Yao, H. Liu, W. Wu, Fabrication of high-contrast gratings for a parallel spectrum splitting dispersive element in a concentrated photovoltaic system. J. Vac. Sci. Technol. B 32(6), 06FG04 (2014)

  5. H. Liu et al., Full-color reflective display system based on high contrast gratings. J. Vac. Sci. Technol. B 32(6), 06FE04 (2014)

    Article  Google Scholar 

  6. M. Switkes, M. Rothschild, Immersion lithography at 157 nm. J. Vac. Sci. Technol. B 19(6), 2353–2356 (2001)

    Article  Google Scholar 

  7. M.G. Kang et al., Organic solar cells using nanoimprinted transparent metal electrodes. Adv. Mater. 20(23), 4408–4413 (2008)

    Article  Google Scholar 

  8. G. Philipp et al., Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes. Microelectron. Eng. 46(1), 157–160 (1999)

    Article  MathSciNet  Google Scholar 

  9. Z. Yu et al., Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography. J. Vac. Sci. Technol. B 21(5), 2089–2092 (2003)

    Article  Google Scholar 

  10. S. Wang, R. Magnusson, Theory and applications of guided-mode resonance filters. Appl. Opt. 32(14), 2606–2613 (1993)

    Article  ADS  Google Scholar 

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Authors and Affiliations

  1. University of Southern California, Los Angeles, CA, USA

    Yuhan Yao, Yifei Wang, He Liu, Yuanrui Li, Boxiang Song & Wei Wu

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  1. Yuhan Yao
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  2. Yifei Wang
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  3. He Liu
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  4. Yuanrui Li
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  5. Boxiang Song
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  6. Wei Wu
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Correspondence to Wei Wu.

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Yao, Y., Wang, Y., Liu, H. et al. Line width tuning and smoothening for periodical grating fabrication in nanoimprint lithography. Appl. Phys. A 121, 399–403 (2015). https://doi.org/10.1007/s00339-015-9278-x

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  • DOI: https://doi.org/10.1007/s00339-015-9278-x

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