Korean Journal of Chemical Engineering

, Volume 20, Issue 5, pp 956–959

Patterning Si by using surface functionalization and microcontact printing with a polymeric ink

  • Kyung-Bok Lee
  • Dong Jin Kim
  • Kuk Ro Yoon
  • Yongseong Kim
  • Insung S. Choi
Article

DOI: 10.1007/BF02697305

Cite this article as:
Lee, KB., Kim, D.J., Yoon, K.R. et al. Korean J. Chem. Eng. (2003) 20: 956. doi:10.1007/BF02697305

Abstract

This paper describes a simple procedure for patterning Si substrate using a combination of surface functionalization and microcontact printing(ΜCP). The Si/SiO2 surfaces were chemically modified to present self-assembled monolayers (SAMs) of siloxanes terminating in reactive carboxylic anhydride groups and then patterned with poly(ethylene imine) (PEI) by, ΜCP We used the patterned thin films of PEI as etch resists on Si surfaces.

Key words

Pattern Generation Microcontact Printing(ΜCP) Self-assembled Monolayers (SAMs) Si Etching 

Copyright information

© Korean Institute of Chemical Engineering 2003

Authors and Affiliations

  • Kyung-Bok Lee
    • 1
  • Dong Jin Kim
    • 1
  • Kuk Ro Yoon
    • 1
  • Yongseong Kim
    • 1
    • 2
  • Insung S. Choi
    • 1
  1. 1.Department of ChemistryKorea Advanced Institute of Science and Technology (KAIST)DaejeonKorea
  2. 2.Division of Chemistry and Chemical EngineeringKyungnam University MasanKyungnamKorea

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