International Journal of Minerals, Metallurgy, and Materials

, 18:589

Comparative study of oxidation ability between boron-doped diamond (BDD) and lead oxide (PbO2) electrodes

Authors

    • Department of Environmental EngineeringPeking University
  • Xiu-ping Zhu
    • Department of Environmental EngineeringPeking University
  • Fan-xiu Lü
    • Department of Materials Science and EngineeringUniversity of Science and Technology Beijing
  • Jin-ren Ni
    • Department of Environmental EngineeringPeking University
Article

DOI: 10.1007/s12613-011-0482-1

Cite this article as:
Wei, J., Zhu, X., Lü, F. et al. Int J Miner Metall Mater (2011) 18: 589. doi:10.1007/s12613-011-0482-1

Abstract

The electrochemical oxidation capabilities of two high-performance electrodes, the boron-doped diamond film on Ti (Ti/BDD) and the lead oxide film on Ti (Ti/PbO2), were discussed. Hydroxyl radicals (·HO) generated on the electrode surface were detected by using p-nitrosodimethylaniline (RNO) as the trapping reagent. Electrochemical oxidation measurements, including the chemical oxygen demand (COD) removal and the current efficiency (CE), were carried out via the degradation of p-nitrophenol (PNP) under the galvanostatic condition. The results indicate that an indirect reaction, which is attributed to free hydroxyl radicals with high activation, conducts on the Ti/BDD electrode, while the absorbed hydroxyl radicals generated at the Ti/PbO2 surface results in low degradation efficiency. Due to quick mineralization which combusts PNP to CO2 and H2O absolutely by the active hydroxyl radical directly, the CE obtained on the Ti/BDD electrode is much higher than that on the Ti/PbO2 electrode, notwithstanding the number of hydroxyl radicals produced on PbO2 is higher than that on the BDD surface.

Keywords

thin filmsdiamond filmslead oxideborn dopinghydroxyl radicalschemical oxygen demand (COD)oxidation
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© University of Science and Technology Beijing and Springer-Verlag Berlin Heidelberg 2011