Nano Research

, Volume 1, Issue 2, pp 158–165

Wafer scale synthesis of dense aligned arrays of single-walled carbon nanotubes

Authors

  • Weiwei Zhou
    • Department of Electrical Engineering and Computer ScienceUniversity of California
  • Christopher Rutherglen
    • Department of Electrical Engineering and Computer ScienceUniversity of California
    • Department of Electrical Engineering and Computer ScienceUniversity of California
Open AccessResearch Article

DOI: 10.1007/s12274-008-8012-9

Cite this article as:
Zhou, W., Rutherglen, C. & Burke, P.J. Nano Res. (2008) 1: 158. doi:10.1007/s12274-008-8012-9

Abstract

Here we present an easy one-step approach to pattern uniform catalyst lines for the growth of dense, aligned parallel arrays of single-walled carbon nanotubes (SWNTs) on quartz wafers by using photolithography or polydimethylsiloxane (PDMS) stamp microcontact printing (µCP). By directly doping an FeCl3/methanol solution into Shipley 1827 photoresist or polyvinylpyrrolidone (PVP), various catalyst lines can be well-patterned on a wafer scale. In addition, during the chemical vapor deposition (CVD) growth of SWNTs the polymer layers play a very important role in the formation of mono-dispersed nanoparticles. This universal and efficient method for the patterning growth of SWNTs arrays on a surface is compatible with the microelectronics industry, thus enabling of the fabrication highly integrated circuits of SWNTs.

Keywords

Single-walled carbon nanotubes (SWNTs)chemical vapor deposition (CVD)photolithographymicrocontact printing (µCP)
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Copyright information

© Tsinghua Press and Springer-Verlag GmbH 2008