Frontiers of Optoelectronics in China

, Volume 2, Issue 3, pp 308–311

Simple technique to fabricate microscale and nanoscale silicon waveguide devices

Authors

  • Yao Chen
    • Department of Electronic Science and TechnologyHuazhong University of Science and Technology
    • Wuhan National Laboratory for OptoelectronicsHuazhong University of Science and Technology
  • Junbo Feng
    • Wuhan National Laboratory for OptoelectronicsHuazhong University of Science and Technology
    • Wuhan National Laboratory for OptoelectronicsHuazhong University of Science and Technology
    • State Key Laboratory on Advanced Optical Communication Systems and NetworksPeking University
    • School of Electrical and Computer EngineeringGeorgia Institute of Technology
  • Christopher J. Summers
    • School of Materials Science and EngineeringGeorgia Institute of Technology
  • David S. Citrin
    • School of Electrical and Computer EngineeringGeorgia Institute of Technology
    • Unité Mixte Internationale 2958 Georgia Tech-CNRSGeorgia Tech Lorraine
  • Jun Yu
    • Department of Electronic Science and TechnologyHuazhong University of Science and Technology
Research Article

DOI: 10.1007/s12200-009-0049-1

Cite this article as:
Chen, Y., Feng, J., Zhou, Z. et al. Front. Optoelectron. China (2009) 2: 308. doi:10.1007/s12200-009-0049-1

Abstract

Fabrication of microscale and nanoscale silicon waveguide devices requires patterning silicon, but until recently, exploitation of the technology has been restricted by the difficulty of forming ever-small features with minimum linewidth fluctuation. A technique was developed for fabricating such devices achieving vertical sidewall profile, smooth sidewall roughness of less than 10 nm, and fine features of 40 nm. Subsequently, silicon microring resonator and silicon-grating coupler were realized using this technique.

Keywords

nanofabricationsilicon waveguideroughnessmicroring resonatorgrating coupler

Copyright information

© Higher Education Press and Springer-Verlag GmbH 2009