Frontiers of Optoelectronics in China

, Volume 2, Issue 3, pp 308–311

Simple technique to fabricate microscale and nanoscale silicon waveguide devices

  • Yao Chen
  • Junbo Feng
  • Zhiping Zhou
  • Christopher J. Summers
  • David S. Citrin
  • Jun Yu
Research Article

DOI: 10.1007/s12200-009-0049-1

Cite this article as:
Chen, Y., Feng, J., Zhou, Z. et al. Front. Optoelectron. China (2009) 2: 308. doi:10.1007/s12200-009-0049-1

Abstract

Fabrication of microscale and nanoscale silicon waveguide devices requires patterning silicon, but until recently, exploitation of the technology has been restricted by the difficulty of forming ever-small features with minimum linewidth fluctuation. A technique was developed for fabricating such devices achieving vertical sidewall profile, smooth sidewall roughness of less than 10 nm, and fine features of 40 nm. Subsequently, silicon microring resonator and silicon-grating coupler were realized using this technique.

Keywords

nanofabricationsilicon waveguideroughnessmicroring resonatorgrating coupler

Copyright information

© Higher Education Press and Springer-Verlag GmbH 2009

Authors and Affiliations

  • Yao Chen
    • 1
    • 2
  • Junbo Feng
    • 2
  • Zhiping Zhou
    • 2
    • 3
    • 4
  • Christopher J. Summers
    • 5
  • David S. Citrin
    • 4
    • 6
  • Jun Yu
    • 1
  1. 1.Department of Electronic Science and TechnologyHuazhong University of Science and TechnologyWuhanChina
  2. 2.Wuhan National Laboratory for OptoelectronicsHuazhong University of Science and TechnologyWuhanChina
  3. 3.State Key Laboratory on Advanced Optical Communication Systems and NetworksPeking UniversityBeijingChina
  4. 4.School of Electrical and Computer EngineeringGeorgia Institute of TechnologyAtlantaUSA
  5. 5.School of Materials Science and EngineeringGeorgia Institute of TechnologyAtlantaUSA
  6. 6.Unité Mixte Internationale 2958 Georgia Tech-CNRSGeorgia Tech LorraineMetzFrance