Korean Journal of Chemical Engineering

, Volume 25, Issue 2, pp 364–367

Photocatalytic activities and specific surface area of TiO2 films prepared by CVD and sol-gel method

Authors

    • Department of Environmental EngineeringSunchon National University
Materials (Organic, Inorganic, Electronic, Thin Films), Polymer, Fluidization, Particle Technology

DOI: 10.1007/s11814-008-0060-z

Cite this article as:
Jung, S. Korean J. Chem. Eng. (2008) 25: 364. doi:10.1007/s11814-008-0060-z

Abstract

The photocatalytic activity of CVD grown films shows significant, non-linear (sigmoid-like) dependency on the film thickness. However, the photocatalytic activity of sol-gel grown film is almost independent of the film thickness. The specific surface area of sol-gel grown films is very small, regardless of the film thickness. Conversely, the specific surface area of CVD grown films indicates significant thickness dependency. The specific area and photocatalytic activity were found to show very similar dependencies on the film thickness.

Key words

TiO2 FilmChemical Vapor Deposition MethodSol-Gel MethodSpecific Surface AreaPhotocatalytic Activity

Copyright information

© Springer 2008